The anisotropic film properties of m-plane GaN deposited by metal organic vapour phase epitaxy (MOVPE) on LiAlO 2 substrates are investigated. To study the development of layer properties during epitaxy, the total film thickness is varied between 0.2 and 1.7 µm. A surface roughening is observed caused by the increased size of hillock-like features. Additionally, small steps which are perfectly aligned in (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) planes appear for samples with a thickness of ~0.5 µm and above. Simultaneously, the X-ray rocking curve (XRC) full width at half maximum (FWHM) values become strongly dependent on incident X-ray beam direction beyond this critical thickness. Anisotropic in-plane compressive strain is initially present and gradually relaxes mainly in the [11][12][13][14][15][16][17][18][19][20] direction when growing thicker films. Low-temperature photoluminescence (PL) spectra are dominated by the GaN near-band-edge peak and show only weak signal related to basal plane stacking faults (BSF). The measured background electron concentration is reduced from ~10 20 cm -3 to ~10 19 cm -3 for film thicknesses of 0.2 µm and ~1 µm while the electron mobilities rise from ~20 to ~130 cm 2 /Vs. The mobilities are significantly higher in [0001] direction which we explain by the presence of extended planar defects in the prismatic plane. Such defects are assumed to be also the cause for the observed surface steps and anisotropic XRC broadening. . This is especially helpful for the design of thick quantum wells or double heterostructure devices to mitigate the effects of the efficiency droop [2]. Limited availability of large-scale freestanding nonpolar GaN wafers as well as their high price favours the heteroepitaxial growth on foreign substrates. (100) LiAlO 2 is an interesting option for this approach because of the very low lattice mismatch with m-plane (1-100) GaN. It amounts to -1.7 % and -0.3 % in [11][12][13][14][15][16][17][18][19][20] and [0001] direction of GaN, respectively, giving rise to anisotropic strain in the layer [3]. In addition to that, the material is produced by the comparably cheap Czochralski pulling method. A major disadvantage of this substrate is the thermal and chemical instability which demands special care on the epitaxial process and leads to highly n-type doped films, most likely related to oxygen incorporation [4]. The growth of high-quality m-plane GaN on LiAlO 2 was already reported using various techniques as molecular beam epitaxy (MBE) [5], hydride vapour phase epitaxy (HVPE) [6] and metal organic vapour phase epitaxy (MOVPE) [7]. However, only few reports contain detailed data on the anisotropic film properties [8]. In this contribution, we present an elaborate investigation on the development of the anisotropic crystal properties during MOVPE of m-plane GaN on LiAlO 2 .