Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

Shindo, Wataru; Wang, E.H.; Akella, Ram; Strojwas, Andrzej J.

doi:10.1109/iwstm.1997.629421

1997 2nd International Workshop on Statistical Metrology

DOI: 10.1109/iwstm.1997.629421

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Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

Wataru Shindo

E.H. Wang²,

Ram Akella³

et al.

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Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

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