1988
DOI: 10.1351/pac198860050795
|View full text |Cite
|
Sign up to set email alerts
|

Expanding plasma used for plasma deposition

Abstract: Abstract

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

4
13
0

Year Published

1989
1989
2000
2000

Publication Types

Select...
6
2

Relationship

2
6

Authors

Journals

citations
Cited by 24 publications
(17 citation statements)
references
References 6 publications
4
13
0
Order By: Relevance
“…At higher growth rate, saturation of the hardness is observed. In figure 3(d ) the hardness is plotted as a function of the inverse energy coefficient and the observed behaviour is again in agreement with earlier observations [6].…”
Section: (4)supporting
confidence: 90%
See 1 more Smart Citation
“…At higher growth rate, saturation of the hardness is observed. In figure 3(d ) the hardness is plotted as a function of the inverse energy coefficient and the observed behaviour is again in agreement with earlier observations [6].…”
Section: (4)supporting
confidence: 90%
“…At the Eindhoven University of Technology, a deposition technique has been developed which is based on an expanding thermal plasma [6]. With this technique carbon films have been deposited, varying from amorphous hydrogenated films [7] to graphite [8], diamond [9] and fluorohydrogenated films [10,11].…”
Section: Introductionmentioning
confidence: 99%
“…As can be seen from particles from the jet will lose their forward momentum more efficiently at higher pressure. The hydrogen drift velocity profile is very similar to that of argon measured in a pure argon plasma beam [16] which implies that the flow characteristics of the plasma beam are mainly determined by the argon atoms.…”
Section: Anomalous Atomic Hydrogen Shock Pattern In a Supersonic Plassupporting
confidence: 55%
“…' In a wall-stabilised arc (cascade arc of the Maecker type) an argon plasma is created at sub-atmospheric pressure [3] with a current of 20-100 A [5]. After passing a nozzle the plasma expands in a deposition chamber at a significantly lower pressure (10-1000 Pa) [6].…”
Section: Experimental Set-upmentioning
confidence: 99%
“…Applications of low temperature plasmas are of great importance: treatment of exhaust gases [1], thin film deposition (a-C:H, diamond, graphite) [2,3], hydrocarbon processing [4], and others. These plasmas present deviations from the thermal equilibrium, and consequently, elaborate spectroscopic analyses are difficult to perform.…”
Section: Introductionmentioning
confidence: 99%