2017
DOI: 10.1088/2058-6272/aa885f
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Experimental and simulation investigation of electrical and plasma parameters in a low pressure inductively coupled argon plasma

Abstract: The electrical and plasma parameters of a low pressure inductively coupled argon plasma are investigated over a wide range of parameters (RF power, flow rate and pressure) by diverse characterizations. The external antenna voltage and current increase with the augment of RF power, whereas decline with the enhancement of gas pressure and flow rate conversely. Compared with gas flow rate and pressure, the power transfer efficiency is significantly improved by RF power, and achieved its maximum value of 0.85 afte… Show more

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Cited by 4 publications
(8 citation statements)
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“…To compare the experimental and simulated values of electron density distribution at a specific absorbed power, the capacitance in the matching circuit is experimentally adjusted by Smith chart to match the internal impedance of the RF power supply so that a given power such as 400 W, 350 W and 300 W is transmitted into the plasma. The power transfer efficiency is 96.3%, 94.9% and 93.0% at an absorbed power of 400 W, 350 W and 300 W, respectively, as measured by a similar method in reference 21 . Second, a FEM model with the same physical dimensions as the ICP generator experimental setup is established.…”
Section: Introductionmentioning
confidence: 86%
“…To compare the experimental and simulated values of electron density distribution at a specific absorbed power, the capacitance in the matching circuit is experimentally adjusted by Smith chart to match the internal impedance of the RF power supply so that a given power such as 400 W, 350 W and 300 W is transmitted into the plasma. The power transfer efficiency is 96.3%, 94.9% and 93.0% at an absorbed power of 400 W, 350 W and 300 W, respectively, as measured by a similar method in reference 21 . Second, a FEM model with the same physical dimensions as the ICP generator experimental setup is established.…”
Section: Introductionmentioning
confidence: 86%
“…Some of the lower levels are metastable and do not decay . The metastable density has been measured by Yang et al and is higher than the Ar + -ion density . In several studies on Ar containing ICP plasma, the ratio of the Ar I lines at 811.5 and 750.4 nm is studied.…”
Section: Resultsmentioning
confidence: 97%
“…49 The metastable density has been measured by Yang et al and is higher than the Ar + -ion density. 50 In several studies on Ar containing ICP plasma, the ratio of the Ar I lines at 811.5 and 750.4 nm is studied. Czerwiec and Graves (CG) found for pure Ar a one-to-one correlation of this ratio and T e .…”
Section: Resultsmentioning
confidence: 99%
“…In recent years, non-thermal plasma technology (e.g., gliding arc plasma, glow plasma, microwave plasma, radio frequency plasma, etc) has been widely applied in diverse industrial areas owing to its unique advantages of high chemical selectivity, efficient energy consumption and tunable operation parameters [6]. Amongst versatile plasma sources, inductively coupled plasma (ICP) emerges as the most promising technology in material manufacturing [7,8]. When compared to the conventional growth of graphene nanosheets using a CVD approach, which is built on an elevated temperature of ∼1000 °C and a long reaction time of ∼30 min [9,10], ICP discharge could promote a facile formation of graphene nanosheets at a much lower temperature, due to its own merits of high plasma density and the generation of abundant active species (ions, excited molecules, radicals, photons).…”
Section: Introductionmentioning
confidence: 99%
“…Seo et al applied ICP on honey to facilitate the fabrication of single-layer graphene, which was applicable in gas sensors [3]. Angjian et al revealed the underlying mechanism of various active species in ICP, which contributed to the understanding of the reactions of particles and the growth of graphene nanosheets [4,8].…”
Section: Introductionmentioning
confidence: 99%