2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2016
DOI: 10.1109/ispsd.2016.7520837
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Experimental investigation of 650V superjunction IGBTs

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Cited by 22 publications
(11 citation statements)
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“…The majority of investigations for the SJ RC-IGBT structure have been simulation based due to the nature of manufacturing IGBTs using Field Zone (FZ) wafers and the concern regarding the creation of voids within the structure [41]. Experimental results for the SJ SPT-IGBT and SJ NPT-IGBT were reported validating the simulations, showing that the switching losses of the SJ NPT-IGBT were lower than the SJ SPT-IGBT.…”
Section: A Rc-igbt With Superjunction Structurementioning
confidence: 91%
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“…The majority of investigations for the SJ RC-IGBT structure have been simulation based due to the nature of manufacturing IGBTs using Field Zone (FZ) wafers and the concern regarding the creation of voids within the structure [41]. Experimental results for the SJ SPT-IGBT and SJ NPT-IGBT were reported validating the simulations, showing that the switching losses of the SJ NPT-IGBT were lower than the SJ SPT-IGBT.…”
Section: A Rc-igbt With Superjunction Structurementioning
confidence: 91%
“…Experimental results for the SJ SPT-IGBT and SJ NPT-IGBT were reported validating the simulations, showing that the switching losses of the SJ NPT-IGBT were lower than the SJ SPT-IGBT. The SJ-NPT had better short circuit ruggedness, but both exhibited superior on-state and switching performance compared to a traditional SPT-IGBT [41]. The results highlight that the tradeoff between the forward and reverse conduction capabilities in the superjunction design is difficult to optimise [10].…”
Section: A Rc-igbt With Superjunction Structurementioning
confidence: 96%
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“…The direct wafer bonding technique could be employed to manufacture this device. The SJ pillars can be formed either by using a trench and refill technique [11] or by other demonstrated techniques such as that reported in [12]. The proposed fabrication would require the front and backside wafers to be formed separately, with a SJ implant applied to both wafers.…”
Section: Introductionmentioning
confidence: 99%