2007
DOI: 10.1016/j.ijheatmasstransfer.2007.03.013
|View full text |Cite
|
Sign up to set email alerts
|

Experimental investigation of microchannel coolers for the high heat flux thermal management of GaN-on-SiC semiconductor devices

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
24
0

Year Published

2009
2009
2024
2024

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 81 publications
(24 citation statements)
references
References 21 publications
0
24
0
Order By: Relevance
“…One of the most pressing challenges in current and next-generation electronics is heat removal of wide band gap semiconductors based on gallium nitride (GaN) and silicon carbide (SiC), for high-power radiofrequency (RF) applications [4]. For example, monolithic microwave integrated circuits (MMICs) based on GaN high electron mobility transistor (HEMT) technology are devices of particular importance for microwave applications.…”
Section: Introductionmentioning
confidence: 99%
See 2 more Smart Citations
“…One of the most pressing challenges in current and next-generation electronics is heat removal of wide band gap semiconductors based on gallium nitride (GaN) and silicon carbide (SiC), for high-power radiofrequency (RF) applications [4]. For example, monolithic microwave integrated circuits (MMICs) based on GaN high electron mobility transistor (HEMT) technology are devices of particular importance for microwave applications.…”
Section: Introductionmentioning
confidence: 99%
“…Even on the backside of the die, the heat flux can still be > 1 kW/cm 2 [6]. Such high fluxes are likely to induce high temperatures in the gate area, which can reduce the lifetime and the reliability of the GaN HEMT devices [4]. To lower the near junction temperature and handle the high heat loads, new cooling methods are needed.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Due to the high-power densities induced in these devices locally near the drain side edge of the gate, it is clear that moving thermal management solutions closer to the heat generation region is critical in order to reduce the overall junction temperature of the device. A number of solutions have been proposed to reduce the junction temperatures in AlGaN/GaN HEMTs [1]- [4]. These solutions include the use of high thermal conductivity substrates such as diamond [5] and microchannel cooling to effectively remove thermal energy from the device [4].…”
Section: Introductionmentioning
confidence: 99%
“…A number of solutions have been proposed to reduce the junction temperatures in AlGaN/GaN HEMTs [1]- [4]. These solutions include the use of high thermal conductivity substrates such as diamond [5] and microchannel cooling to effectively remove thermal energy from the device [4]. The majority of AlGaN/GaN HEMTs are grown on SiC substrates due to its high thermal conductivity (∼400 W/mK), which is ∼2.5 times that of GaN.…”
Section: Introductionmentioning
confidence: 99%