Localized electrochemical analysis in the micrometer-range is useful for the in situ investigation of galvanic plating processes. Two techniques are presented, a potentiometric and a chronoamperometric one, using xyz-positionable microelectrodes for practical concentration measurements in microstructures during cathodic metal deposition. Locally measured concentration data c(xy) are related to local current density i(xy), which is not obtainable by other means in a system containing excess supporting electrolyte.