“…The uneven distribution of the deposit thickness will result in a significantly reduced dimensional accuracy even the failure of the deposited M 3 features and components. Therefore, a number of investigators have made a variety of efforts to improve the deposit thickness distribution during TM-ECD.In the traditional maskless electrodeposition processes, assisting auxiliary electrode/thief electrode (cathode or anode) [ 20 , 21 , 22 , 23 , 24 ], using an electric field shield/conformal anode [ 25 ], reciprocating the cathode [ 26 ], applying modulated electric current [ 27 , 28 ], and adding appropriate additives [ 29 , 30 , 31 ] are frequently used methods to improve the deposit thickness distribution. However, these traditional methods are less effective for the TM-ECD processes, since the patterned photoresist through-masks are inherently inhomogeneous regarding the distribution of the current density and also the mass transfer rate distribution, especially when the electrodeposition is carried out via electrically filling the multiple-scale through-masks.…”