2005
DOI: 10.1109/tadvp.2004.841672
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Experimental validation of crosstalk simulations for on-chip interconnects using S-parameters

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Cited by 36 publications
(14 citation statements)
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“…High resolution cross-sectional scanning electron microscopy and optical microscopy were used to measure the relevant dimensions of the fabricated structures. Parasitics signals were removed from the measured S-parameters using a de-embedding approach [1], [36]. In Fig.…”
Section: Numerical Resultsmentioning
confidence: 99%
“…High resolution cross-sectional scanning electron microscopy and optical microscopy were used to measure the relevant dimensions of the fabricated structures. Parasitics signals were removed from the measured S-parameters using a de-embedding approach [1], [36]. In Fig.…”
Section: Numerical Resultsmentioning
confidence: 99%
“…There are other possible ways of bisecting the THRU. T-equivalent-based bisection is one example (Kobrinsky et al, 2005). Once the foundations of the 2-port method are more firmly established, the multiport method can be used with greater confidence.…”
Section: Discussionmentioning
confidence: 99%
“…Resistance and inductance are frequency-dependent parameters [18], and frequency dependency of R and L is modeled with W-element in the R(f)L(f)C model. As for frequency independent parameters, such as R, L, and C in RLC model and C in R(f)L(f)C model, interconnects are assumed to have the constant values in all frequency range.…”
Section: A Measurement and Simulation Setupmentioning
confidence: 99%