2017
DOI: 10.1364/oe.25.008611
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Exploiting high-order phase-shift keying modulation and direct-detection in silicon photonic systems

Abstract: A computational approach to evaluate the bit-error ratio (BER) in silicon photonic systems employing high-order phase-shift keying (PSK) modulation formats is presented. Specifically, the investigated systems contain a silicon based optical interconnect, namely a strip silicon photonic waveguide or a silicon photonic crystal waveguide, and direct-detection receivers suitable to detect PSK and amplitude-shaped PSK signals. The superposition of a PSK signal and complex additive white Gaussian noise passes throug… Show more

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Cited by 4 publications
(1 citation statement)
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“…[14,15] In particular, the strong light confinement enables the dispersion engineering in silicon-on-insulator (SOI) WGs either by changing the transverse size of the WGs or by nanopatterning them. [16][17][18] Furthermore, the SOI WGs possess very large third-order nonlinearities, allowing for the implementation of key active and passive optical functionalities embracing Raman amplification, [19] four-wave mixing (FWM), [20] self-phase modulation, [21] cross-phase modulation, [22] two-photon absorption, [23] and pulse self-steepening. [24] In addition to the SOI WGs, SiO 2 , Si 3 N 4 , GeSi, and Ge-on-Si are also the materials frequently utilized in Si photonics.…”
Section: Introductionmentioning
confidence: 99%
“…[14,15] In particular, the strong light confinement enables the dispersion engineering in silicon-on-insulator (SOI) WGs either by changing the transverse size of the WGs or by nanopatterning them. [16][17][18] Furthermore, the SOI WGs possess very large third-order nonlinearities, allowing for the implementation of key active and passive optical functionalities embracing Raman amplification, [19] four-wave mixing (FWM), [20] self-phase modulation, [21] cross-phase modulation, [22] two-photon absorption, [23] and pulse self-steepening. [24] In addition to the SOI WGs, SiO 2 , Si 3 N 4 , GeSi, and Ge-on-Si are also the materials frequently utilized in Si photonics.…”
Section: Introductionmentioning
confidence: 99%