Exploration on chemical mechanical planarization of ZnO functional thin films for novel devices

Zhang, Kailiang; Taofeng, Zhang; Wang, Fang; Yuan, Yujie; Li, Yunwei

doi:10.1016/j.mee.2012.08.007

Cited by 7 publications

(4 citation statements)

References 19 publications

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“…This layer fully covered the RuO x catalysts (Figure f). On the other hand, since the AZO layer is based on ZnO, it can react with the alkaline solution based on KOH by the following reaction The H 2 O from this reaction attacks the Cu 2 O NW core.…”

Section: Resultsmentioning

confidence: 99%

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Structural and Compositional Investigations on the Stability of Cuprous Oxide Nanowire Photocathodes for Photoelectrochemical Water Splitting

Son¹,

Pan

Mayer

et al. 2021

ACS Appl. Mater. Interfaces

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Cuprous oxide (Cu2O) is a promising photocathode material for photoelectrochemical (PEC) water splitting. Recently, the PEC performances of Cu2O-based devices have been considerably improved by introducing nanostructures, semiconductor overlayers, and hydrogen evolution reaction (HER) catalysts. However, Cu2O devices still suffer from poor stability in aqueous solution, especially in strong acidic or alkaline conditions, despite the use of an intrinsically stable oxide overlayer as a protection layer. Thus, it is essential to fully understand the stability of the entire Cu2O photocathodes in these conditions for establishing suitable protection strategies to achieve durable PEC water splitting. In this work, the stability of bare and protected Cu2O nanowire (NW) photocathodes was evaluated in detail using microscopy techniques and compositional analyses. The insights gained in this work will guide the design and synthesis of durable photoelectrodes for PEC water splitting.

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Section: Resultsmentioning

confidence: 99%

“…On the other hand, since the AZO layer is based on ZnO, it can react with the alkaline solution based on KOH by the following reaction. 38 ZnO…”

mentioning

confidence: 99%

Structural and Compositional Investigations on the Stability of Cuprous Oxide Nanowire Photocathodes for Photoelectrochemical Water Splitting

Son¹,

Pan

Mayer

et al. 2021

ACS Appl. Mater. Interfaces

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“…In order to fabricate more reliable and high density novel RRAM devices, CMP has been carried out in various forms to planarize the different materials. [13][14][15] Lee et al 13 improved the interface contact by CMP which provide better switching properties' uniformity. Based on the changing pH values, Yin et al 14 conducted a fundamental investigation on the removal rate and RMS roughness of VO x CMP.…”

mentioning

confidence: 99%

“…Based on the changing pH values, Yin et al 14 conducted a fundamental investigation on the removal rate and RMS roughness of VO x CMP. Zhang et al 15 studied on the effect of various chemical and mechanical factors on performance including removal rate and surface topography of ZnO thin films.…”

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confidence: 99%

Optimization and Mechanism on Chemical Mechanical Planarization of Hafnium Oxide for RRAM Devices

Zhang

Feng

Cao

et al. 2014

ECS J. Solid State Sci. Technol.

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Chemical mechanical planarization (CMP) of hafnium oxide including chemical and mechanical factors has been investigated in this paper. We demonstrated that the introduction of sodium fluoroborate (NaBF4) into hafnium oxide CMP has efficiently improved the removal rate from 5 nm/min to 95.5 nm/min. According to the static etch rate and effects of down force and platen rotation rate on hafnium oxide CMP, the Preston equation RR = kPV was modified to RR = kPV + Rc which suggests that the hafnium oxide CMP is determined by the combination of chemical and mechanical process. Moreover, we proposed a possible mechanism that the reaction of introduced NaBF4 with hafnium oxide provides a softer surface layer, enabling hafnium oxide to be easily polished and removed. Therefore, the removal rate of hafnium oxide was substantially enhanced. Using this method, the hafnium oxide surface with sub-nanometric roughness (RMS) was achieved, which can provide the related planarization material and technology for hafnium oxide nano-devices.

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Optical and structural characterization of zinc oxide thin films upon ion beam assisted smoothing

Henn,

Dornberg,

Müller

et al. 2024

Thin Solid Films

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Exploration on chemical mechanical planarization of ZnO functional thin films for novel devices

Cited by 7 publications

References 19 publications

Structural and Compositional Investigations on the Stability of Cuprous Oxide Nanowire Photocathodes for Photoelectrochemical Water Splitting

Structural and Compositional Investigations on the Stability of Cuprous Oxide Nanowire Photocathodes for Photoelectrochemical Water Splitting

Optimization and Mechanism on Chemical Mechanical Planarization of Hafnium Oxide for RRAM Devices

Optical and structural characterization of zinc oxide thin films upon ion beam assisted smoothing

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