2021
DOI: 10.1016/j.solmat.2021.111338
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Exploring the efficiency limiting parameters trade-off at rear surface in passivated emitter rear contact (PERC) silicon solar cells

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Cited by 10 publications
(14 citation statements)
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“…This can be explained by the fact that the H 2 SO 4 -containing HF–HNO 3 -based solutions are highly reactive toward silicon because the addition of H 2 SO 4 promotes the formation of nitronium ions NO 2 + . Recently, alkaline polishing based on KOH/additive/DIW has been rapidly developed in the photovoltaic industry due to the ability to obtain a flatter rear surface compared to acidic polishing and being more environmentally friendly . As a comparison, the rear surfaces of the last group of wafers were treated with alkaline polishing (labeled as group F) to obtain an almost flat surface, as shown in Figure f.…”
Section: Results and Discussionmentioning
confidence: 99%
“…This can be explained by the fact that the H 2 SO 4 -containing HF–HNO 3 -based solutions are highly reactive toward silicon because the addition of H 2 SO 4 promotes the formation of nitronium ions NO 2 + . Recently, alkaline polishing based on KOH/additive/DIW has been rapidly developed in the photovoltaic industry due to the ability to obtain a flatter rear surface compared to acidic polishing and being more environmentally friendly . As a comparison, the rear surfaces of the last group of wafers were treated with alkaline polishing (labeled as group F) to obtain an almost flat surface, as shown in Figure f.…”
Section: Results and Discussionmentioning
confidence: 99%
“…In this process, the monocrystalline silicon (mono‐Si) wafer is usually etched by ~8.0 μm after the traditional double‐sided alkaline texturing step and then etched by ~5.0 μm in the rear acidic polishing step after POCl 3 diffusion and laser doping, and ~13.0 μm of wafer is removed in total. To further improve polishing flatness, lower process costs, and reduce emissions of nitrogen oxide (NO x ) that is difficult to dispose of, an alkaline polishing process has been developed rapidly instead of the acidic polishing process in recent years 16 . In this approach, batch‐type alkaline polishing is usually carried out after POCl 3 diffusion and laser doping.…”
Section: Introductionmentioning
confidence: 99%
“…To further improve polishing flatness, lower process costs, and reduce emissions of nitrogen oxide (NO x ) that is difficult to dispose of, an alkaline polishing process has been developed rapidly instead of the acidic polishing process in recent years. 16 In this approach, batchtype alkaline polishing is usually carried out after POCl 3 diffusion and laser doping. Prior to polishing, a thermal oxidation treatment is usually applied to the front surface to protect the laser-doped region, followed by the removal of the rear wrapped PSG layer by using an in-line HF process with water film protection at the front surface.…”
Section: Introductionmentioning
confidence: 99%
“…The application of passivation technology can not only improve the passivation quality of the backside but also ensure a high open circuit voltage (V oc ) and short circuit current (I sc ), thus ensuring a high conversion efficiency of the solar cells 1 . In 2019, the efficiency of PERC cells produced by LONGi Solar reached 24.06%, 2,3 which is 2% points higher than the average cell efficiency of the solar cell industry. In the same year, the production capacity of PERC cells accounted for nearly 70% of the production capacity of solar cells 4,5 …”
Section: Introductionmentioning
confidence: 99%