Self-assembled monolayers (SAMs) of ω-carboxylic acid thiols are very important in the surface modification of metals, especially on gold surfaces. Indeed, the 3mercaptopropanoic acid (MPA) and its ester or amide derivatives are widely used for SAMs-based sensor design. It was already shown that MPA does not suffer C-S bond scission when adsorbed on Au. On the other hand, in this work we demonstrate that its simplest derivative, methyl 3-mercapto propionate (Me-MPA), is prone to form significant amounts of atomic sulfur when adsorbs on Au. The MPA-derivatives are more sensible than MPA itself to alkaline solutions and its SAM-based sensors will rapidly degrade given atomic sulfur. In this work, we study the simplest MPA-derivative Me-MPA SAMs on preferentiallyoriented Au(111) surfaces by XPS and electrochemical measurements. It was found that the desulfuration of Me-MPA depends on its preparation conditions (grown from ethanol or toluene solution) and on its post-treatment with alkaline solution. In order to explain the S-C bond scission on Me-MPA SAMs we discuss different reaction mechanism. We concluded that the reaction mechanism involves an E1cB elimination pathway (β