Exploring the impact of a cetyltrimethylammonium bromide surfactant on the electrochemical performance of tungsten oxide thin films

Razzaq, Munazza; Saifullah, Muhammad; Akhtar, Ramzan; Khan, Muhammad Jawad; Imran, Zahid; Rehan, Muhammad; Jamal, Ahsan; Iqbal, Sajid; Anjum, Mohsin Ali Raza; Mehboob, Sheeraz

doi:10.1039/d3nj05635j

New J. Chem.

2024

DOI: 10.1039/d3nj05635j

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Exploring the impact of a cetyltrimethylammonium bromide surfactant on the electrochemical performance of tungsten oxide thin films

Munazza Razzaq,

Muhammad Saifullah,

Ramzan Akhtar

et al.

Abstract: A WO3 thin film prepared with a CTAB/Na2WO4·2H2O molar ratio of 2.451 exhibits considerably improved current density, charge storage capacity, and diffusion kinetics.

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Exploring the impact of a cetyltrimethylammonium bromide surfactant on the electrochemical performance of tungsten oxide thin films

Abstract: A WO3 thin film prepared with a CTAB/Na2WO4·2H2O molar ratio of 2.451 exhibits considerably improved current density, charge storage capacity, and diffusion kinetics.

Cited by 0 publications

References 49 publications

No citations

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