1999
DOI: 10.1364/oe.4.000467
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Extended depth of field and aberration control for inexpensive digital microscope systems

Abstract: We present a new application and current results for extending depth of field using wave front coding. A cubic phase plate is used to code wave fronts in microscopy resulting in extended depths of field and inexpensive chromatic aberration control. A review of the theory behind cubic phase plate extended depth of field systems is given along with the challenges that are face when applying the theory to microscopy. Current results from the new extended depth of field microscope systems are shown.

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Cited by 109 publications
(45 citation statements)
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“…This paraxial model for the cubic phase mask has been thoroughly verified experimentally for low NA systems [3,24].…”
Section: Paraxial Modelmentioning
confidence: 79%
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“…This paraxial model for the cubic phase mask has been thoroughly verified experimentally for low NA systems [3,24].…”
Section: Paraxial Modelmentioning
confidence: 79%
“…The CPM has since been investigated for use in standard (low aperture) microscopy [24]. The mask can give a ten times increase in the depth of field without loss of transverse resolution.…”
Section: Methods For Extending the Depth Of Fieldmentioning
confidence: 99%
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“…MPoVM is a relatively simple and cost-effective approach, not depending on expensive and vulnerable moving parts, that can be readily implemented on existing fluorescence microscopes. MPoVM can be extended with additional functionality, for example to optically extend the depth of field to up to tens of micrometers [29][30][31][32], or combined with light-sheet excitation and detection [33]. This latter approach, however, will substantially increase the complexity of the current setup.…”
Section: Discussionmentioning
confidence: 99%
“…Because of relative simplicity in manufacture, the cubic phase mask is the most widely used form in the WFC technique [6][7][8]. Various optimized methods have been used to improve the performance of the cubic phase mask (CPM) [9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%