2006
DOI: 10.1021/jp058262g
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Extending the Photoresponse of TiO2 to the Visible Light Region:  Photoelectrochemical Behavior of TiO2 Thin Films Prepared by the Radio Frequency Magnetron Sputtering Deposition Method

Abstract: TiO(2) thin films prepared by a radio frequency magnetron sputtering (RF-MS) deposition method were found to show an enhanced photoelectrochemical response in the visible light region. By controlling the temperature and the gaseous medium during the deposition step, it was possible to control the properties of these films. The photoelectrochemical behavior of the sputtered TiO(2) thin films was compared with that of a commercial TiO(2) sample, and the sputtered films showed higher incident photon to the charge… Show more

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Cited by 89 publications
(69 citation statements)
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“…Figure 2 shows the UV-vis absorption (transmittance) spectra of the TiO 2 thin films prepared at different temperatures. The films prepared at low temperatures (T < 473 K) showed absorption edges at around 360 nm and clear interference fringes in visible light regions, similar to the TiO 2 thin films prepared by sol-gel (Heller 1995;Negishi et al 1995Negishi et al , 1998 or ionized cluster beam (ICB) deposition (Takeuchi et al 2000a, b;Yamashita et al 1998;Kikuchi et al 2006) (Chap. 2.1).…”
Section: Physical and Optical Properties Of Tio 2 Thin Films Preparedmentioning
confidence: 52%
See 1 more Smart Citation
“…Figure 2 shows the UV-vis absorption (transmittance) spectra of the TiO 2 thin films prepared at different temperatures. The films prepared at low temperatures (T < 473 K) showed absorption edges at around 360 nm and clear interference fringes in visible light regions, similar to the TiO 2 thin films prepared by sol-gel (Heller 1995;Negishi et al 1995Negishi et al , 1998 or ionized cluster beam (ICB) deposition (Takeuchi et al 2000a, b;Yamashita et al 1998;Kikuchi et al 2006) (Chap. 2.1).…”
Section: Physical and Optical Properties Of Tio 2 Thin Films Preparedmentioning
confidence: 52%
“…Moreover, this method was also effective in modifying transparent TiO 2 thin film photocatalysts to also absorb visible light. Studies in this novel metal ion-implantation method have provided valuable information on modifying the electronic properties of both TiO 2 powder and thin film photocatalysts (Anpo 1997(Anpo , 2000aAnpo et al 1998;Takeuchi et al 2000a;Yamashita et al 1998;Kikuchi et al 2006). However, since the complexity in the preparation processes impedes their mass production at low cost, less cumbersome preparation methods are strongly desired for widespread, global applications.…”
Section: A Rf-magnetron Sputtering Deposition Methods To Preparementioning
confidence: 99%
“…The photogenerated electrons can be readily collected at the conducting surface in a photoelectrochemical cell [23,27]. Photoelectrochemical measurements were performed using a standard three-electrode system consisting of a working electrode (TiO 2 /Ti, nw-TiO 2 (X)/Ti), Pt wire counter electrode and SCE reference electrode in an Ar-purged 0.25 M K 2 SO 4 aqueous solution.…”
Section: Resultsmentioning
confidence: 99%
“…The area of the working electrode exposed to light was about 0.2 cm 2 . The incident photon to current conversion efficiency (IPCE), defined as the number of electrons collected per incident photon, was determined by measuring the photocurrent (I ph ) of the electrodes at each excitation wavelength and by using the following equation [23,24]:…”
Section: Photoelectrochemical Measurementsmentioning
confidence: 99%
“…Figure 6 shows that the HF-Vis-TiO 2 /Ti electrode exhibits a much higher photocurrent than Vis-TiO 2 /Ti under both UV and visible light. Moreover, the apparent quantum efficiencies, that is, the incident photonto-current conversion efficiency (IPCE), of these electrodes are defined as the number of electrons collected per incident photon and determined by measuring the photocurrent (I ph ) of the electrodes at each excitation wavelength using the following equation (Kikuchi et al 2006):…”
Section: Effect Of Chemical Etching By Hf Solution On the Photocatalymentioning
confidence: 99%