Extraction of effective dielectric constants and the effect of process damage of low-k dielectrics for advanced interconnects

Near-Field Scanning Microwave Microscope for Interline Capacitance Characterization of Nanoelectronics Interconnect

“…Therefore, acquiring the interline capacitance nondestructively and analyzing it in a timely manner can benefit both the development and production stages of interconnect integration, while addressing the semiconductor industry's need for in-line and in-situ metrologies [3]. V At present, the only technique capable of measuring interconnect interline capacitance is the interdigital comb capacitor that is formed by two identical comb-shaped structures interleaved in such way that the fingers alternate [4] (such geometry is often employed in microwave circuitry to create a lumped element capacitor). The measurement is typically done with an LCR meter at 0.1-1 MHz via contacting the test pads connected to the combs.…”

“…At present, the only technique capable of measuring interconnect interline capacitance is the interdigital comb capacitor that is formed by two identical comb-shaped structures interleaved in such way that the fingers alternate [4] (such geometry is often employed in microwave circuitry to create a lumped element capacitor). The measurement is typically done with an LCR meter at 0.1-1 MHz via contacting the test pads connected to the combs.…”