Extreme ultraviolet lithography with table top lasers

Marconi, M. C.; Wachulak, P.

doi:10.1016/j.pquantelec.2010.03.001

Cited by 31 publications

(17 citation statements)

References 96 publications

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“…For accurate positioning of the FZP along the optical axis, a closed-loop piezo-stage (LPS-45, PI miCos GmbH, Germany) was used (positioning repeatability of 50 nm). The entire microscope has a very compact size: (W × D× H) (100 × 70 × 160) cm 3 . Such EUV microscope, to our knowledge, is currently one of the most compact EUV imaging tools reported in the literature.…”

Section: Euv Microscope Constructionmentioning

confidence: 99%

“…For that, electromagnetic radiation in the extreme ultraviolet (EUV) spectral range (λ = 10-121 nm wavelength [1]) allows shifting the diffraction limit into a nanometer range [2,3]. Much work has already been done developing different photon-based imaging techniques and schemes, according to the Rayleigh criterion, which states that the light of shorter wavelength improves the diffraction-limited spatial resolution.…”

Section: Introductionmentioning

confidence: 99%

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A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

et al. 2016

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research, such as mask inspection [6,7]-reaching 22-nm half pitch resolution or lithography [8], as well as free electron lasers [9] for coherent diffraction imaging (CDI) schemes [10]. These facilities, although state of the art and dedicated to cutting-edge science experiments, are not "user friendly," with limited user access and require high maintenance costs, because of their scale and complexity. Another approach is to use tabletop high-order harmonic (HHG) sources [11] for sub-100-nm spatial resolution imaging [12]; however, typical 10 −6 -10 −5 HHG conversion efficiency is very low and often does not allow for a proper reconstruction [13], the system is very complicated, and typical CDI requires time-consuming numerical data processing. Ptychographic schemes, although providing very high spatial resolution, are serial in nature, extensively time-consuming and computationally demanding.To partially overcome these limitations, other compact EUV sources, such as discharge [14], Z-pinch [15] or laserproduced plasma sources [16], coupled to zone plates or Schwarzschild mirrors, were used. The first one is compact and shows very good spatial resolution, but requires often (~30 k pulses) capillary replacements, the second one demonstrates quite low performance in terms of spatial resolution and field of view exploiting inadequate mode of imaging for lithographic mask inspection, while the last one requires debris mitigation schemes.The use of compact, short-wavelength sources often does not allow for high signal-to-noise ratio image acquisition. An example of that are recent developments in soft X-ray (SXR) microscopy in so-called water window, such as a compact soft X-ray microscope based on a single nitrogen gas jet, capable of resolving features ~100 nm later improved to ~50 nm in size providing high spatial resolution; however, the exposure time for Siemens star test pattern was equal to 1-2 h, limiting the usability of Abstract A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25-75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.

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Section: Euv Microscope Constructionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

et al. 2016

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“…Ptychographic techniques, usually based on employment of hard X-ray beams, although provide very high spatial resolution, are extensively time consuming during the reconstruction process [7]. Imaging in the EUV range permits to analyse very thin samples, nanofilms and nanostructures, because the EUV radiation is absorbed by solid materials with thicknesses of the order of 100 nm [8] and by gaseous materials with thicknesses of the order of a few millimetres [9]. Employing such radiation allows to visualize in a direct way through absorption contrast mechanism the flow of the gas, usually investigated with other techniques, such as the interferometry [10].…”

Section: Introductionmentioning

confidence: 99%

Nanoimaging using soft X-ray and EUV laser-plasma sources

Wachulak

Torrisi

Ayele

et al. 2018

EPJ Web of Conferences

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Abstract. In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the "waterwindow" spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

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“…Imaging in the EUV range can be used to analyze very thin samples, nanofilms, and nanostructures. That is because the EUV radiation is absorbed by solid materials with thicknesses of the order of~100 nm [19] and by gaseous materials with thicknesses of the order of a few millimetres [20]. It was demonstrated that the radiation from a capillary discharge laser operating at a wavelength of λ = 46.9 nm EUV can obtain images with a spatial resolution better than 55 nm [21,22], and that the spatial resolution of holographic images employing the same wavelength, can be improved up to sub-50 nm [23].…”

Section: Introduction and Previous Achievementsmentioning

confidence: 99%

Bioimaging Using Full Field and Contact EUV and SXR Microscopes with Nanometer Spatial Resolution

et al. 2017

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We present our recent results, related to nanoscale imaging in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral ranges and demonstrate three novel imaging systems recently developed for the purpose of obtaining high spatial resolution images of nanoscale objects with the EUV and SXR radiations. All the systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes-operating at 13.8 nm and 2.88 nm wavelengths, respectively-are currently capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The third system is a SXR contact microscope, operating in the "water-window" spectral range (2.3-4.4 nm wavelength), to produce an imprint of the internal structure of the investigated object in a thin surface layer of SXR light sensitive poly(methyl methacrylate) photoresist. The development of such compact imaging systems is essential to the new research related to biological science, material science, and nanotechnology applications in the near future. Applications of all the microscopes for studies of biological samples including carcinoma cells, diatoms, and neurons are presented. Details about the sources, the microscopes, as well as the imaging results for various objects will be shown and discussed.

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Extreme ultraviolet lithography with table top lasers

Cited by 31 publications

References 96 publications

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

Nanoimaging using soft X-ray and EUV laser-plasma sources

Bioimaging Using Full Field and Contact EUV and SXR Microscopes with Nanometer Spatial Resolution

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