2014
DOI: 10.1016/j.mee.2014.03.022
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Fabricating embedded SU-8 microstructures with asymmetric inside cross section by double-side multiple partial exposure method

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Cited by 4 publications
(2 citation statements)
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“…The one-time exposure method can satisfy this requirement of chip, a transparent substrate (e.g., cover glass) is needed for light pass during lithography and let the optical signal pass through during the detection. So compared with the traditional two-side exposure method 34 , we provided the method which was more simple, flexible and convenient to fabricate aligned microchannels by UV exposure once, and during the fabrication, the method does not require the alignment process. SEM images of the twin microchannels are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The one-time exposure method can satisfy this requirement of chip, a transparent substrate (e.g., cover glass) is needed for light pass during lithography and let the optical signal pass through during the detection. So compared with the traditional two-side exposure method 34 , we provided the method which was more simple, flexible and convenient to fabricate aligned microchannels by UV exposure once, and during the fabrication, the method does not require the alignment process. SEM images of the twin microchannels are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The partial exposure approach is a promising technique to fabricate small SU8 channels [41][42][43][44][45]. In this approach, the top wall of the channel is established using a lower exposure dose, while the sidewalls are made through a larger exposure dose.…”
Section: Introductionmentioning
confidence: 99%