Fabricating ordered 2-D nano-structured arrays using nanosphere lithography

Zhang, Chenlong; Cvetanovic, Sandra; Pearce, Joshua M.

doi:10.1016/j.mex.2017.07.001

Cited by 50 publications

(41 citation statements)

References 24 publications

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“…In step (1), a 2.5 cm × 2.5 cm glass (Si wafer) substrate is ultrasonically cleaned by using acetone, methanol, and distilled water in an ultrasonic bath for 20 min, respectively, and then heated on a hot plate, at 150 • C for 30 min. In step (2), a closely packed PS nanospheres monolayer is prepared by the interface method [46,47]. A layer of PS is then spin-coated onto the cleaned glass substrate (Figure 2a).…”

Section: Fabrication Methodsmentioning

confidence: 99%

Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

et al. 2019

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In this paper, a periodic metallic–dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag thin-film deposition. The mechanism of the surface and gap plasmon modes supported by the fabricated structure is numerically demonstrated by the three-dimensional finite element method. The measured and simulated absorptance spectra are observed to have a same trend and a qualitative fit. Our fabricated plasmonic sensor shows an average sensitivity of 340.0 nm/RIU when applied to a refractive index sensor ranging from 1.0 to 1.6. The proposed substrates provide a practical plasmonic nanorod-based sensing platform, and the fabrication methods used are technically effective and low-cost.

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Section: Fabrication Methodsmentioning

confidence: 99%

Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

et al. 2019

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“…It is possible to use nanospheres with a wide range of sizes (approximately 100 nm to 2 µm), which covers broad waveband (e.g., UV, IR) applications. In this paper, spin-coating was used first as an inherently simple, fast, and repeatable method for producing the mask or colloidal crystals on lab-scale [10,32]. On the other hand, this technique is limited in accuracy and sensitive to the material roughness.…”

Section: Pros and Cons Of The Nanosphere Lithography For Diamond Strumentioning

confidence: 99%

“…The masks are usually created and/or structured using conventional lithographic techniques (such as optical, electron-beam, ion-beam, laser interference, X-ray lithography) [3,6,7]. Patterning with unconventional lithographic techniques (e.g., nanosphere lithography, nanoimprinting, soft lithography) can also be applied to fabricate various micro-and nanostructured diamond films [8][9][10]. These techniques have received interest because they are less expensive, are fast, and do not require complex equipment [11,12].…”

Section: Introductionmentioning

confidence: 99%

Nanosphere Lithography for Structuring Polycrystalline Diamond Films

2020

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This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. Various arrays of diamond nanostructures-close-packed and non-close-packed monolayers over substrates with various levels of surface roughness, noble metal films over nanosphere arrays, ordered arrays of holes, and unordered pores-were created using reactive ion etching, chemical vapour deposition, metallization, and/or lift-off processes. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The surface morphology of the samples was characterized using scanning electron microscopy. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.

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“…A thin metallic film with an array of subwavelength holes has been proposed before to improve the efficiency of organic solar cells [26]. However, the honeycomb pattern benefits from scalable and relatively low cost self-assembled nano-beads lithography technique [11,[27][28][29][30][31]. In [32], the authors used nano-beads lithography to make a perforated metallic film which in turn could be used to lower the resistance of the top contact.…”

Section: Plasmonic Thin Film A-si:h Solar Cellmentioning

confidence: 99%

“…A new design proposed to r was numerica the silver mes experiments w top of the ultr sheet resistan top contact in [28,42,43]. Fa integration of further prove Funding National Scie…”

Section: Conclusiomentioning

confidence: 99%

Scalable honeycomb top contact to increase the light absorption and reduce the series resistance of thin film solar cells

Sadatgol

Bihari

Pearce

et al. 2018

Opt. Mater. Express

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This paper presents a novel design for the top contact of thin film photovoltaic (PV) solar cells. The new top contact is formed by fabricating a 20nm thin honeycomb shaped silver mesh on top of an ultra-thin 13nm of indium tin oxide. The new top contact offers the potential to reduce the series resistance of the cell while increasing the light current via plasmonic resonance. Using the nano-bead lithography technique the honeycomb top contact was fabricated and electrically characterized. The experimental results verified the new contact reduces the sheet resistance by about 40%. Numerical simulations were then used to analyze the potential performance enhancement in the cell. The results suggest the proposed top contact integrated with a typical thin film hydrogenated amorphous silicon PV device would lead to more than an 8% improvement in the overall efficiency of the cell.

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Fabricating ordered 2-D nano-structured arrays using nanosphere lithography

Abstract: Graphical abstract

Cited by 50 publications

References 24 publications

Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

Nanosphere Lithography for Structuring Polycrystalline Diamond Films

Scalable honeycomb top contact to increase the light absorption and reduce the series resistance of thin film solar cells

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