Fabrication and Application of Si-Doped Diamond Coated Welding Dies

Abstract

Si-doped diamond films are deposited on cobalt cemented tungsten carbide (WC-Co) welding dies using hot filament chemical vapor deposition (HFCVD) method, where tetraethoxysilane (C8H20O4Si) is introduced in the reactive chamber as silicon source by bubbling method. Filed emission scanning electron microscope (FESEM) and Raman spectroscopy are used to characterize the as-deposited diamond films. The results show that silicon doping can reduce the diamond crystal size and residual stress of diamond films, and also increase the FWHM of first order diamond Raman line. The polishing time of diamond coated welding dies also can be shortened by silicon doping. Si-doped diamond coated welding dies possesses comparable practical application performance with conventional diamond coated welding dies. Compared with the nylon and WC-Co welding dies, the working lifetime of diamond coated welding dies increases 200 and 10 times, respectively.