2021
DOI: 10.1007/s11664-021-09280-1
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Fabrication and Characterization of Back-to-Back Schottky Diode in Ni/ZnO/Ag Nanojunction

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Cited by 4 publications
(2 citation statements)
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“…The produced ZnO/Ni contacts are used as control samples; Ni fails to fulfill condition (1) and ZnO/Ni interfaces are known to produce Schottky diode characteristics. 36 An additional set of experiments are carried out by depositing Zn, Al, Ti and Bi top electrodes on a ZnO coated zinc substrate (see below). The results are intended to show that the previously obtained comparative CR results are independent of the different textures of the ZnO thin films presumably resulting from deposition on different metallic substrates.…”
Section: Methodsmentioning
confidence: 99%
“…The produced ZnO/Ni contacts are used as control samples; Ni fails to fulfill condition (1) and ZnO/Ni interfaces are known to produce Schottky diode characteristics. 36 An additional set of experiments are carried out by depositing Zn, Al, Ti and Bi top electrodes on a ZnO coated zinc substrate (see below). The results are intended to show that the previously obtained comparative CR results are independent of the different textures of the ZnO thin films presumably resulting from deposition on different metallic substrates.…”
Section: Methodsmentioning
confidence: 99%
“…and GaN, the MgZnO/ZnO layers were selectively etched after prepatterning using diluted HCl wet etching without damaging the GaN layer. Figure 2(b) displays the I−V curve of the MgZnO/ZnO/GaN heterojunction device with the rectifying diode characteristics for both forward and reverse bias, which are analogous to back-to-back Schottky or tunnel diodes [22,23]. In the case of a forward bias, a positive bias is applied to the contact on the MgZnO layer, whereas a negative bias is applied to the GaN side.…”
Section: Optical Propertiesmentioning
confidence: 99%