“…Temperatures of the cells during the air-blowing were set at 90 • C. A polysilane solution was prepared by mixing chlorobenzene (Fujifilm Wako Pure Chemical Corporation, 0.5 mL) with decaphenylcyclopentasilane (DPPS, Osaka Gas Chemicals, Osaka, Japan, OGSOL SI-30-15, 10 mg). During the last 15 s of the third spin-coating of the perovskite precursor solutions, the DPPS polysilane solution was also spin-coated on the perovskite layer [51][52][53][54]. After the spin-coating, the thin films were annealed from 90 to 160 • C in steps of 10 • C, holding each temperature for 10 min [55].…”