Fabrication and Characterization of Low-Loss Gaussian-Like Reversed Ridge Optical Waveguides

Wei, Wei; Lu, Xiao; Pang, Fufei; Wei, Heming; Zhang, Liang; Wang, Tingyun

doi:10.1109/lpt.2022.3179657

Cited by 4 publications

(1 citation statement)

References 21 publications

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“…We fabricated a few mode S-shape waveguide by photolithography. In the fabrication, the photolithography is combined with the pre-exposure process [4] which can prevent oxygen inhibition and enable the lithography to proceed successfully in the air. We measured transmission loss and inter-channel crosstalk of the waveguide, and also studied the modes supported by the S-shape waveguide.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and characterization of few mode S-shape optical waveguide at 1310 nm/1550 nm

Xu,

Pang,

Zhu

et al. 2023

Fourteenth International Conference on Information Optics and Photonics (CIOP 2023)

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Section: Introductionmentioning

confidence: 99%

Fabrication and characterization of few mode S-shape optical waveguide at 1310 nm/1550 nm

Xu,

Pang,

Zhu

et al. 2023

Fourteenth International Conference on Information Optics and Photonics (CIOP 2023)

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PCB Lamination Process Compatible Low-loss Single-mode Polymer Waveguides

Liu

Shi

et al. 2022

2022 Asia Communications and Photonics Conference (ACP)

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Optimization of the interlayer distance for low-loss and low-crosstalk double-layer polymer optical waveguides

Fang¹,

Deng²,

Huang³

et al. 2023

Opt. Express

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The interlayer distance optimized for low-loss and low-crosstalk double-layer polymer optical waveguides was investigated to enhance their transmission performance. Simulations were conducted to determine the minimal interlayer distances for double-layer optical waveguides with different core sizes. An optimal interlayer distance of 24 µm was identified for a 20 µm × 20 µm double-layer waveguide, which ensured interlayer crosstalk below -30 dB when roughness remained under 80 nm. The double-layer waveguides were fabricated employing ultraviolet lithography combined with the overlay alignment method. Based on experimental optimization, the important fabrication parameters were optimized, such as a plasma treatment time of 10 s, a core exposure dose of 500 mJ/cm2, and a cladding exposure dose of 240 mJ/cm2. Additionally, the fabricated double-layer waveguides, with an interlayer distance of 24.5 µm, exhibited low transmission losses of less than 0.25 dB/cm at 850 nm and 0.40 dB/cm at 1310 nm, respectively. The low interlayer crosstalk values were less than -52 dB at 850 nm and -60 dB at 1310 nm, respectively. The agreement between the experimental results and the simulation findings indicates that this method offers a promising approach for fabricating double-layer waveguides with good performances.

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Fabrication and Characterization of Low-Loss Gaussian-Like Reversed Ridge Optical Waveguides

Cited by 4 publications

References 21 publications

Fabrication and characterization of few mode S-shape optical waveguide at 1310 nm/1550 nm

Fabrication and characterization of few mode S-shape optical waveguide at 1310 nm/1550 nm

PCB Lamination Process Compatible Low-loss Single-mode Polymer Waveguides

Optimization of the interlayer distance for low-loss and low-crosstalk double-layer polymer optical waveguides

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