Fabrication and characterization of NFMA/FTO electrochemical thin film by electrodeposition and immersion techniques: An effective detector for H2O2 and sunlight-driven MB degradation

Gamal Hasan, Gamil; Khelef, Abdelhamid; Chaabia, Nacer; Ali Mohammed, Hamdi; Laid Tedjani, Mohammed; Althamthami, Mohammed

doi:10.1016/j.jphotochem.2023.115112

Journal of Photochemistry and Photobiology A: Chemistry

2023

DOI: 10.1016/j.jphotochem.2023.115112

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Fabrication and characterization of NFMA/FTO electrochemical thin film by electrodeposition and immersion techniques: An effective detector for H2O2 and sunlight-driven MB degradation

Gamil Gamal Hasan,

Abdelhamid Khelef,

Nacer Chaabia

et al.

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2024

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Cited by 2 publications

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Synthesis of Cu-Supported ZSM-5/UiO-66 Composite Catalysts for Efficient Degradation of Methylene Blue

Zhang,

Wu,

et al. 2024

Korean J. Chem. Eng.

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Synthesis of Cu-Supported ZSM-5/UiO-66 Composite Catalysts for Efficient Degradation of Methylene Blue

Zhang,

Wu,

et al. 2024

Korean J. Chem. Eng.

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Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency

Althamthami,

Temam,

Temam

et al. 2024

Sci Rep

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Semiconductor films are crucial in photocatalysis applications, yet their controlled production remains challenging. Previous studies have mainly focused on deposition processes, heating rates, and doping of semiconductor oxides. In this paper, we introduce a novel method for fabricating tenorite (CuO) semiconductor films with varying precursor concentrations (0.01, 0.02, 0.04, 0.06, and 0.1 g/ml) using a dip-coating technique. We explore the impact of contact angles, 3D surface topography, and film thickness on photoactivation properties, areas with limited previous research focus. The results demonstrate that higher-concentration tenorite films (0.1 g/ml) exhibit rougher surfaces (77.3 nm), increased hydrophobicity (65.61°), improved light-harvesting ability, enhanced charge separation, and higher active oxygen output. The crystal sizes were within the range of 7.3–44.1 nm. Wettability tests show a 21.47% improvement in the 0.1 g/ml film surface under indirect sunlight compared to darkness. Transmittance rates in the 600 nm range were from 0.02 to 90.94%. The direct optical band gaps were 1.21–2.74 eV, while the indirect band gaps remained unaffected (0.9–1.11 eV). Surface morphology analysis reveals an increased presence of grains with higher concentrations. Regarding photocatalysis's impact on film morphology and copper content, SEM images reveal minimal changes in film structure, while copper content remains stable with slight variations. This suggests strong adhesion of tenorite to the film after photocatalysis. Tenorite thin films display exceptional photocatalytic efficiency, making them suitable for practical applications.

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Fabrication and characterization of NFMA/FTO electrochemical thin film by electrodeposition and immersion techniques: An effective detector for H2O2 and sunlight-driven MB degradation

Cited by 2 publications

References 63 publications

Synthesis of Cu-Supported ZSM-5/UiO-66 Composite Catalysts for Efficient Degradation of Methylene Blue

Synthesis of Cu-Supported ZSM-5/UiO-66 Composite Catalysts for Efficient Degradation of Methylene Blue

Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency

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