2016
DOI: 10.1080/14328917.2015.1131919
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Fabrication and electrical characterization of p-ZnIn2Se4/n-Si heterojunction diode structure

Abstract: Semiconducting thin films of p-ZnIn 2 Se 4 were deposited on a crystalline n-silicon (Si) substrate by a flash evaporation technique. A heterojunction diode comprising of Au/p-ZnIn 2 Se 4 /n-Si/Al structure was fabricated. The heterojunction was subjected to current (I)-voltage (V) and capacitance (C)-voltage (V) characterization. The p-ZnIn 2 Se 4 /n-Si heterojunction showed behaviour typical of a p-n junction diode. The heterojunction diode ideality factor, rectification ratio, barrier height and carrier con… Show more

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Cited by 15 publications
(1 citation statement)
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“…However, careful sample preparation processes are necessary for the film to exhibit optical characteristics typical of the bulk material. The authors have inured the growth [7], [8] electrical [9], optical [10], and magnetotransport [11] chattels of several undoped and doped binary and ternary semiconducting compounds and their bids as Schottky diodes [12], heterojunctions [13,14], photovoltaics [15], [16] and memory switching gizmos [17][18][19][20].…”
Section: Introductionmentioning
confidence: 99%
“…However, careful sample preparation processes are necessary for the film to exhibit optical characteristics typical of the bulk material. The authors have inured the growth [7], [8] electrical [9], optical [10], and magnetotransport [11] chattels of several undoped and doped binary and ternary semiconducting compounds and their bids as Schottky diodes [12], heterojunctions [13,14], photovoltaics [15], [16] and memory switching gizmos [17][18][19][20].…”
Section: Introductionmentioning
confidence: 99%