2009
DOI: 10.1021/nl902808r
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Fabrication and Electrical Properties of Si Nanowires Synthesized by Al Catalyzed Vapor−Liquid−Solid Growth

Abstract: The synthesis of epitaxially oriented Si nanowires at high growth rates (>1 microm/min) was demonstrated on (111) Si substrates using Al as the catalyst. The use of high H(2) and SiH(4) partial pressures was found to be effective at reducing problems associated with Al oxidation and nanowire nucleation, enabling growth of high aspect ratio structures at temperatures ranging from 500 to 600 degrees C with minimal tapering of the diameter. Because of the high growth rate observed, the Al catalyst is believed to … Show more

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Cited by 75 publications
(80 citation statements)
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“…Several groups have also postulated that metal nanocluster catalysts, especially gold, used to grow NWs could enhance recombination and adversely affect V OC in NW devices (32) (Fig. S4) as the metal catalyst (32) because Al, unlike Au, does not act as a midband gap trap state in Si (33).…”
Section: Resultsmentioning
confidence: 99%
“…Several groups have also postulated that metal nanocluster catalysts, especially gold, used to grow NWs could enhance recombination and adversely affect V OC in NW devices (32) (Fig. S4) as the metal catalyst (32) because Al, unlike Au, does not act as a midband gap trap state in Si (33).…”
Section: Resultsmentioning
confidence: 99%
“…65 To further investigate this possibility, NWs were synthesized using Al catalyst 65 which, unlike Au, does not act as a mid-band gap trap state in Si. 66 Nevertheless, the best illuminated I-V curve for the core/multi-shell diode geometry ( Figure cm/s, a-SiN x :H provides superior passivation with S << 70 cm/s and a correspondingly very long minority-carrier diffusion length L n >> 30 µm.…”
Section: Device Electrical Transport and Performancementioning
confidence: 99%
“…Various methods have been used to synthesize SiNWs, such as laser ablation (LA), thermal evaporation (TE), chemical vapor deposition (CVD), and plasma enhanced chemical vapor deposition (PECVD) [20], [21], [22] and [23].…”
Section: Introductionmentioning
confidence: 99%