2005
DOI: 10.1016/j.optmat.2004.08.026
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Fabrication and optical properties of Er-doped multilayers Si-rich SiO2/SiO2: size control, optimum Er–Si coupling and interaction distance monitoring

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Cited by 41 publications
(33 citation statements)
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“…Such results show that, to increase EQE in SiO x :Er system, one has to ensure formation of well-defined Si-ncs in perfectly stoichiometric SiO 2 . A promising way to obtain that ideal system would be to separate Si-ncs containing layer (SiO x ) from the Ercontaining layer (Er:SiO 2 ) in multiple stacks of monolayers, similar to SiO x /SiO 2 multilayers recently studied [35,42,43].…”
Section: +mentioning
confidence: 99%
“…Such results show that, to increase EQE in SiO x :Er system, one has to ensure formation of well-defined Si-ncs in perfectly stoichiometric SiO 2 . A promising way to obtain that ideal system would be to separate Si-ncs containing layer (SiO x ) from the Ercontaining layer (Er:SiO 2 ) in multiple stacks of monolayers, similar to SiO x /SiO 2 multilayers recently studied [35,42,43].…”
Section: +mentioning
confidence: 99%
“…As reported in different works, 11,12,18,43 the coupling constant scales with distance following an exponential decay law: this is a clear signature of an electronic exchange mechanism between donor and acceptor generating from wave function overlap ͑Dexter transfer͒. 16 The other possible transfer mechanisms, dipole-dipole interaction ͑Förster͒ and indirect radiative excitation do not likely occur in our system: the former being too slow with respect to the fast transfer time we measured ͑tens of nanoseconds͒, while the latter does not explain the enhancement of Er ions effective excitation cross section, being less efficient than direct excitation itself.…”
mentioning
confidence: 52%
“…The value of the constant R int ͑characteristic interaction distance͒ has been taken from literature and it is equal to 0.5 nm ͑2.1 nm͒ for amorphous Si-nanoclusters 12,43 ͑Si-nanocrystals 17 ͒. Clearly, this simple model can be applied reliably only for Er-Si-np distances smaller than some nanometers, where it is possible to consider interaction among only one single Si-np and many Er ions.…”
mentioning
confidence: 99%
“…In the case of the sample containing only Er ions, there is no signal at 800 nm and a small signal is detected at 1540 nm. It is attributed to the 4 I 13/2 → 4 I 15/2 intra-shell Er ion transition [6][7][8]. For the sample containing only Si-nc, a peak is visible at 800 nm.…”
Section: Resultsmentioning
confidence: 95%
“…The maximum Si-nc size is then equal to the SiO barrier thickness. Such Er-doped multilayer systems can be prepared by RF sputtering [4], magnetron sputtering of Si in vacuum and Er-doped SiO 2 in an oxygen atmosphere [5], reactive magnetron sputtering of SiO 2 and Er 2 O 3 in an hydrogen-argon atmosphere [6] or by evaporation of SiO in an oxygen atmosphere [7,8]. In the last example, Er is introduced by the implantation method.…”
Section: Introductionmentioning
confidence: 99%