2015
DOI: 10.2109/jcersj2.123.523
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Fabrication and opto-electrical properties of amorphous (Zn,B)O thin film by pulsed laser deposition

Abstract: Growth of amorphous ZnO by B doping and their opto-electrical properties are reported. The B-doped ZnO (ZnO:B) films were grown by pulsed laser deposition using polycrystalline ZnO:B ceramic targets. Although the solubility limit of B in bulk ZnO polycrystal was ³4%, 18%-doped ZnO:B showed the shrinkage in the c-axis length. Preferentially (002) ] was smaller than those of the polycrystalline ZnO:B films.

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Cited by 3 publications
(1 citation statement)
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“…The fact that ZnO thin films are readily polycrystalline with a hexagonal würtzite structure close to room temperature on various substrates gives them the disadvantage of reducing the mobility of the charge carriers (electrons) due to dislocations or impurities at the grain boundaries, hence influencing their resulting performances in transistors. Some attempts have been made to obtain amorphous zinc oxide thin films and, thus, to eliminate the grain boundaries by pulsed laser deposition and sputtering at cryogenic temperatures [15][16][17] by using chemical methods [18,19] and, recently, by enhancing the oxygen deficiency in PED [20]. However, these attempts are neither expensive in their applications (cryogenic temperatures) nor does the large oxygen deficiency benefit the fabrication of the transistor's components, which require almost ideal ZnO stoichiometry.…”
Section: Introductionmentioning
confidence: 99%
“…The fact that ZnO thin films are readily polycrystalline with a hexagonal würtzite structure close to room temperature on various substrates gives them the disadvantage of reducing the mobility of the charge carriers (electrons) due to dislocations or impurities at the grain boundaries, hence influencing their resulting performances in transistors. Some attempts have been made to obtain amorphous zinc oxide thin films and, thus, to eliminate the grain boundaries by pulsed laser deposition and sputtering at cryogenic temperatures [15][16][17] by using chemical methods [18,19] and, recently, by enhancing the oxygen deficiency in PED [20]. However, these attempts are neither expensive in their applications (cryogenic temperatures) nor does the large oxygen deficiency benefit the fabrication of the transistor's components, which require almost ideal ZnO stoichiometry.…”
Section: Introductionmentioning
confidence: 99%