2005
DOI: 10.1063/1.2032598
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Fabrication and performance of blue GaN-based vertical-cavity surface emitting laser employing AlN∕GaN and Ta2O5∕SiO2 distributed Bragg reflector

Abstract: GaN-based vertical-cavity surface emitting laser with 3 λ cavity and hybrid mirrors, consisting of the 25 pairs AlN∕GaN dielectric Bragg reflector and the 8 pairs Ta2O5∕SiO2, was fabricated. The laser action was achieved under the optical pumping at room temperature with a threshold pumping energy density of about 53mJ∕cm2. The laser emits 448 nm blue wavelength with a linewidth of 0.25 nm and the laser beam has a degree of polarization of about 84%.

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Cited by 73 publications
(33 citation statements)
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“…A dominant laser emission line at 448.9 nm appears above the threshold pumping energy. The threshold density of this hybrid DBR VCSEL is relatively lower than that of our previous report [28], which may originate from the improvement of the reflectivity of the epitaxially grown AlN/GaN-based DBR inserted with SL layers. The laser emission spectral linewidth reduces as the pumping energy rises above the threshold energy, and approaches 0.17 nm at the pumping energy of 82.5 nJ.…”
Section: B Characteristics Of Optically Pumped Gan-based Vcselcontrasting
confidence: 42%
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“…A dominant laser emission line at 448.9 nm appears above the threshold pumping energy. The threshold density of this hybrid DBR VCSEL is relatively lower than that of our previous report [28], which may originate from the improvement of the reflectivity of the epitaxially grown AlN/GaN-based DBR inserted with SL layers. The laser emission spectral linewidth reduces as the pumping energy rises above the threshold energy, and approaches 0.17 nm at the pumping energy of 82.5 nJ.…”
Section: B Characteristics Of Optically Pumped Gan-based Vcselcontrasting
confidence: 42%
“…The third one is the VCSEL structure combining an epitaxially grown DBR and a dielectric-type DBR that compromises the advantages and disadvantages of the aforementioned two VCSEL structures [ Fig. 3(c)] [28], [29]. The hybrid DBR VCSEL can eliminate the complex process and ensure the feasibility of coplanar contacts with dielectric DBR mesas for the future electrically pumped VCSEL applications.…”
Section: Difficulty In Fabrication Of Nitride-based Vcselmentioning
confidence: 99%
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“…[34][35][36][37][38][39][40] The later consists of growing the n-side DBR (n-DBR) epitaxially, while dielectric layers are deposited for the p-side DBR (p-DBR). Dual dielectric DBR VCSELs, on the other hand, have dielectric n-DBRs and p-DBRs.…”
Section: Motivation For Iii-nitride Tunnel Junction Intracavity Contactsmentioning
confidence: 99%
“…Therefore, a large number of DBR pairs (usually 25-40 pairs) are required to achieve high reflectivity, leading to epitaxial challenges in many material systems. This problem is one of the main impediments in the development of VCSELs and other DBR-based optoelectronic devices in many wavelength regimes, such as blue-green and mid-infrared [31,32]. In addition, during the material growth process the DBR layer thickness and composition must be very precisely controlled in order to achieve high reflectivity.…”
Section: Introductionmentioning
confidence: 99%