2001
DOI: 10.1109/20.966133
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Fabrication and thermal-chemical stability of magnetoresistive random-access memory cells using α-Fe/sub 2/O/sub 3/ bottom spin valves

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Cited by 8 publications
(7 citation statements)
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“…By utilizing this film technology, it is possible to improve the physical properties of iron oxides, allowing for the realization of more multifunctional devices utilizing iron oxides. For example, owing to its efficient spin switching, α-Fe 2 O 3 thin film may be used in memory devices. Additionally, by utilizing the novel properties of α-Fe 2 O 3 thin films, such as skyrmions, they could be used as skyrmion-based memory devices, among other things. Numerous applications of iron oxide thin film are possible to realize through the use of various thin film fabrication techniques.…”
Section: Iron Oxide Thin Filmmentioning
confidence: 99%
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“…By utilizing this film technology, it is possible to improve the physical properties of iron oxides, allowing for the realization of more multifunctional devices utilizing iron oxides. For example, owing to its efficient spin switching, α-Fe 2 O 3 thin film may be used in memory devices. Additionally, by utilizing the novel properties of α-Fe 2 O 3 thin films, such as skyrmions, they could be used as skyrmion-based memory devices, among other things. Numerous applications of iron oxide thin film are possible to realize through the use of various thin film fabrication techniques.…”
Section: Iron Oxide Thin Filmmentioning
confidence: 99%
“…The incorporation of an antiferromagnets layer is critical for exchange bias and magnetization pinning of a ferromagnetic layer in spintronic devices such as magnetic read heads and nonvolatile memories. ,, Among numerous antiferromagnetic materials, α-Fe 2 O 3 shows high thermal and chemical stability which is suitable as a bottom layer of giant magnetoresistance (GMR) spin valves compared to other antiferromagnetic layers . High thermal and chemical stability are important to obtain high-efficiency spintronics devices.…”
Section: Applications Of Iron Oxide Thin Filmmentioning
confidence: 99%
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“…The 1-Mb MRAM based on the PSV technology has been successfully fabricated through the collaboration between USTC and National Chiao Tung University (NCTU), Hsin-chu, Taiwan, R.O.C. The nano oxide layer (NOL) technology [14], [15] is critical to fabricate this device. This approach enables USTC to be a pioneering MRAM manufacturer to offer MRAM products to the users.…”
Section: B Magnetic Tunnel Junction Technologymentioning
confidence: 99%
“…The material has intriguing characteristics and has therefore been suggested for use in many types of technologies, such as magnetic and electronic devices, 3 sensor devices, 4,5 batteries, 6 hydrogen production, 7 photoelectrochemical applications, 8,9 and nanotechnology applications. [10][11][12] This broad range of applications has motivated investigations to understand the fundamental material properties.…”
Section: Introductionmentioning
confidence: 99%