2003
DOI: 10.1016/s0925-3467(02)00244-6
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Fabrication of 1D and 2D structures at submicrometer scale on lithium niobate by electron beam bombardment

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Cited by 54 publications
(29 citation statements)
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“…Moreover, its high electro-optic coefficient and its low optical losses make this material very adequate for optical communication systems. Therefore, the perspective of fabricating miniature electro-optical and all-optical LN devices is attracting the research on LiN bO 3 nanostructuring [4,5]. However, the obtention of good nanometric optical structures in LiN bO 3 continues to be a difficult task due to its wellknown resistivity towards standard machining techniques like wet etching [6].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, its high electro-optic coefficient and its low optical losses make this material very adequate for optical communication systems. Therefore, the perspective of fabricating miniature electro-optical and all-optical LN devices is attracting the research on LiN bO 3 nanostructuring [4,5]. However, the obtention of good nanometric optical structures in LiN bO 3 continues to be a difficult task due to its wellknown resistivity towards standard machining techniques like wet etching [6].…”
Section: Introductionmentioning
confidence: 99%
“…Double ionic implantation is important in order to enlarge the created optical barrier which in turn reduces the optical losses by tunneling in implanted waveguides. The second step was devoted to the fabrication of a PBG structure by EB bombardment combined with a selective chemical etching HF : HNO 3 (1:2) as reported in reference (Restoin et al 2003). The EB was produced using a SEM Philips XL 20, associated with a lithography application (Elphy Quantum by Raith), delivering a pulsated mode with the irradiation parameters reported in Table 1.…”
Section: Methodsmentioning
confidence: 99%
“…It is faster on the faces −z and −y than on +z and +y (face x does not have any difference due to symmetry). However, Restoin et al (2003) showed that both the experimental process and the EB parameters strongly influence the pattern and the geometry of the obtained structure. Moreover, they indicated that the geometry and the nature of pattern are a result of a compromise between various parameters including the probe current, the irradiation time and the thickness of the metallic film used for double-metallization of the sample.…”
Section: Methodsmentioning
confidence: 99%
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“…In our experiment, AFM (NanoScope IIIa Scanning Probe Microscope, Digital Instruments) is used to observe the domain patterns for confirmation. 23 which demonstrated a 2-D domain-inverted structure in a thin layer beneath the negative c-face. In our experiment, the designed pattern seems to induce domain-inversion with a square lattice.…”
Section: Fabrication Of Ferroelectric Domain Gratingmentioning
confidence: 99%