Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of silicon

Strandman, Carola; Rosengren, Lars; Elderstig, H.; Bäcklund, Ylva

doi:10.1109/84.475548

Cited by 90 publications

(57 citation statements)

References 9 publications

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“…The {110} planes are patterned with stripes after etching in the KOH solution with isopropanol, whereas the striped pattern is considerably less pronounced in the TMAH/ Triton solution. These results are in a good agreement with those reported in the literature (Backlund and Rosengren 1992;Strandman et al 1995;Resnik et al 2005). The stripes almost do not appear on the {110} surface when 20 ppm of Triton is added to the KOH etchant.…”

Section: Resultssupporting

confidence: 82%

“…The {110} sidewalls were obtained in ethylenediamine pyrocatechol (EDP) and potassium hydroxide/isopropyl alcohol [KOH/IPA (also called isopropanol)] mixtures, in which the etch rate ratio R(100)/R(110) [ 1 occurred (Backlund and Rosengren 1992;Strandman et al 1995). Although the smooth {110} surface was achieved in EDP, (Rola and Zubel 2011a, b;.…”

Section: Introductionmentioning

confidence: 99%

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Silicon 45° micromirrors fabricated by etching in alkaline solutions with organic additives

et al. 2013

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The fabrication of 45°micromirrors by silicon anisotropic etching in potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH) solutions containing organic additives is investigated in this paper. The reflective planes are formed by {110} sidewall planes inclined at 45°towards the Si (100) wafer. Isopropyl alcohol and Triton X-100 surfactant are used as additives, because they are supposed to provide the etch rate ratio R(100)/R(110) [ 1, which is necessary for {110} sidewalls development. The fabricated spatial microstructures with 45°sidewalls are examined in terms of the {110} surface roughness and the quality of the {110} sidewall profile. The KOH solution saturated with the alcohol gives the striped {110} surface, though the stripes almost disappear after addition of Triton surfactant to KOH and TMAH etchants. The 45°sidewall profiles fully defined by {110} planes are obtained in KOH as well as TMAH solutions containing additives. The measurements of micromirrors' reflectivity indicate that replacement of the alcohol by Triton surfactant in the KOH solution reduces the optical power loss caused by the reflection. The achieved reflectivity is comparable with the one obtained by etching in the TMAH solution with surfactant.

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Section: Resultssupporting

confidence: 82%

Section: Introductionmentioning

confidence: 99%

Silicon 45° micromirrors fabricated by etching in alkaline solutions with organic additives

et al. 2013

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“…In the field of MOEMS, manufacturing of micromirrors formed by {hkl} sidewall planes is particularly interesting (Sadlery et al 1997;Resnik et al 2000;Strandman et al 1995), due to the exact geometries of the etched microstructures and the simplicity of the wet etching technology. The {110} planes are especially attractive, because they can serve as micromirrors inclined at 45°t owards the (100) substrate and thus reflect a light beam at an angle of 90° (Strandman et al 1995;Resnik et al 2005;Yagyu et al 2010;Xu et al 2011). However, to be useful as micromirrors, the {110} planes ought to be very smooth.…”

Section: Introductionmentioning

confidence: 99%

Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

Rola

Zubel

2012

Microsyst Technol

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The influence of alcohol concentration on etch rate and surface morphology of (100) and (110) Si planes was investigated in this paper. The etching processes were carried out in KOH solutions with different concentrations of isopropanol and butanols. The etch rate minima versus alcohol concentration were observed for all the alcohols used in the experiments. Furthermore, close to the concentrations of etch rate minima, the smooth (110) planes were obtained. However, the (100) surfaces were covered with hillocks at these concentrations. Based on the surface tension measurements and literature reports, the explanation of appearance of the etch rate minimum was suggested. In the proposed model, the adsorption maximum corresponds to the complete formation of an alcohol monolayer on Si surface and, consequently, to the etch rate minimum. At higher concentrations of alcohol, the monolayer disappears and the etch rate increases.

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“…This anisotropic etching has the capability to produce exposed crystal planes that are smooth within a few nanometers. Published results vary from a roughness rms of a few nm for a small area [9] to a peak-to valley value of several m [10]. Variations in roughness appear to be attributable to both the process used as well as the size of the measured area.…”

Section: Artifact Designmentioning

confidence: 99%

Silicon Bulk Micromachined Hybrid Dimensional Artifact

et al. 2010

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A mesoscale dimensional artifact based on silicon bulk micromachining fabrication has been developed and manufactured with the intention of evaluating the artifact both on a high precision coordinate measuring machine (CMM) and video-probe based measuring systems. This hybrid artifact has features that can be located by both a touch probe and a video probe system with a k=2 uncertainty of 0.4 m, more than twice as good as a glass reference artifact. We also present evidence that this uncertainty could be lowered to as little as 50 nm (k=2).While video-probe based systems are commonly used to inspect mesoscale mechanical components, a video-probe system's certified accuracy is generally much worse than its repeatability. To solve this problem, an artifact has been developed which can be calibrated using a commercially available high-accuracy tactile system and then be used to calibrate typical production vision-based measurement systems. This allows for error mapping to a higher degree of accuracy than is possible with a glass reference artifact.Details of the designed features and manufacturing process of the hybrid dimensional artifact are given and a comparison of the designed features to the measured features of the manufactured artifact is presented and discussed. Measurement results from vision and touch probe systems are compared and evaluated to determine the capability of the manufactured artifact to serve as a calibration tool for video-probe systems. An uncertainty analysis for calibration of the artifact using a CMM is presented. 3 ACKNOWLEDGMENTS

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Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of silicon

Cited by 90 publications

References 9 publications

Silicon 45° micromirrors fabricated by etching in alkaline solutions with organic additives

Silicon 45° micromirrors fabricated by etching in alkaline solutions with organic additives

Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

Silicon Bulk Micromachined Hybrid Dimensional Artifact

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