Fabrication of a self-aligned microtip field emission array

Forrest, R. D.; Cox, D. C.; Tang, Y. F.; Shannon, John M.; Silva, S. Ravi P.

doi:10.1116/1.1596221

Cited by 7 publications

(1 citation statement)

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[23] Using a excimer KrF laser at an energy density of 242 mJ/cm 2 crystallised strips of films 4 mm wide were produced. This crystallised area was then capped with a 150 nm thick a-SiN layer followed by a 25 nm layer of evaporated Cr as schematically shown in Fig.…”

Section: Nanosilicon Based Materials Cathodesmentioning

confidence: 99%

Nanoengineering of materials for field emission display technologies

Silva

Carey

Chen

et al. 2004

IEE Proc., Circuits Devices Syst.

View full text Add to dashboard Cite

The holy-grail in terms of flat panel displays has been an inexpensive process for the production of large area 'hang on the wall' television that is based on an emissive technology. As such electron field emission displays, in principle, should be able to give high quality pictures, with good colour saturation, and, if suitable technologies for the production of the cathodes over large areas were to be made available, at low cost. This requires a process technology where temperatures must be maintained below 450 o C throughout the entire production cycle to be consistent with the softening temperature of display glass. In this paper we show three possible routes for nanoscale engineering of large area cathodes using low temperature processing that can be integrated into a display technology.The first process is based on carbon nanotube-polymer composites that can be screen printed over large areas and show electron field emission properties comparable with some of the best aligned nanotube arrays. The second process is based on the direct large area growth of carbon nanofibres directly on to substrates held at temperatures ranging from room temperature to 300 o C, thereby making it possible to use inexpensive substrates. The third process is based on the use of excimer laser processing of amorphous silicon for the production of lithography free large area three terminal nanocrystalline silicon substrates. Each route has its own advantages, and flexibility in terms of incorporation into an existing display technology. The harnessing of these synergies will be highlighted together, with the properties of the cathodes developed for the differing technologies.

show abstract

Section: Nanosilicon Based Materials Cathodesmentioning

confidence: 99%