Fabrication of air gap dielectrics by nanoimprint lithography

Nanoimprint lithography of deoxyribonucleic acid biopolymer films

“…Although NIL patterned surfaces are often characterized by cross-sectional scanning electron microscope (SEM) images, profile scans, and atomic force microscope (AFM) surface scans, 16,17 this was not possible with the DNA biopolymer since the film tends to tear at the cleaved edge and obscures the cross-sectional view. Therefore, a qualitative classification method of "excellent," "good," or "poor" was used to describe the imprinted NIL pattern.…”