Fabrication of Arbitrary Three‐Dimensional Polymer Structures by Rational Control of the Spacing between Nanobrushes

Zhou, Feng; Wang, Xiaolong; Shen, Youde; Xie, Zhuang; Zheng, Zijian

doi:10.1002/anie.201102518

Cited by 70 publications

(62 citation statements)

References 43 publications

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“…36 The fast, facile, versatile and scalable SI-CuCRP do not require complex instrumentation or de-oxygenation of the chemicals and is thus most suitable for the large scale production of defined, densely grafted polymer brushes for surface engineering. This allowed the modification of entire wafers by uniform polymer brush coatings using minimal amounts of chemicals.…”

Section: Discussionmentioning

confidence: 99%

Wafer-scale synthesis of defined polymer brushes under ambient conditions

et al. 2015

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A method is presented that allows for the first time the preparation of highly defined polymer brush coatings on the wafer-scale under ambient conditions (room temperature, exposure to air) from a broad variety of monomers. The discovered high oxygen-tolerance of the surface-initiated Cu(0)-mediated controlled radical polymerization (SI-CuCRP) yields entire wafers homogeneously covered by a polymer brush of linear, high molar mass polymers with narrow dispersities (Đ = 1.1) at extremely high grafting densities (≈1 chain per nm 2 ). The low-tech and air tolerant method requires only ≲4 mL reaction solution containing a monomer and a ligand between two facing substrates. Thus, the SI-CuCRP is scalable to any surface area with minimal costs and minimal equipment. Despite the simplicity of the method, the high endgroup fidelity of SI-CuCRP is demonstrated by the preparation of a tetrablock copolymer brush which is the first example of a higher order block copolymer brush prepared by any surface-initiated polymerization. Finally, we present a new facile lithographic technique, the copper plate proximity printing (CP 3 ), which relies on the proximity of the bulk copper surface to the initiator-bearing substrate. The CP 3 is resist-and development-free and transfers the copper plate profile (of a copper coin) directly into an image composed of a 3D polymer brush. † Electronic supplementary information (ESI) available. See

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Section: Discussionmentioning

confidence: 99%

Wafer-scale synthesis of defined polymer brushes under ambient conditions

et al. 2015

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“…We utilized DNL to precisely control the distance between the initiator features from 1000 nm to 25 nm, and found a morphological transition from isolated to bridged to planar structures with decreasing lateral space (Figure 8 A). [ 59 ] This discovery led to the invention of a " feature-density" method for the fabrication of 3D patterned polymer brushes. In this method, the key step is to fabricate arrays of nanodots of polymer brushes with controlled dotto-dot spacing.…”

Section: Polymer Brushesmentioning

confidence: 99%

“…Reproduced with permission. [ 59 ] C) Parallelly fabricated 3D patterned polymer brush nanostructures by using an 18-tip 1D cantilever array.…”

Section: Polymer Brushesmentioning

confidence: 99%

Polymer Nanostructures Made by Scanning Probe Lithography: Recent Progress in Material Applications

Xie

Zhou

Tao

et al. 2012

Macromol. Rapid Commun.

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Scanning probe lithography (SPL) is a series of techniques that utilizes a scanning probe or an array of probes for surface patterning. Recent developments of new material systems and patterning approaches have made SPL a promising, low‐cost, bench‐top, and versatile tool for fabricating various polymer nanostructures, with extraordinary importance in physical sciences, life sciences and nanotechnology. This feature article highlights the recent progress in four material applications: polymer resists, polymeric carriers for patterning functional materials, electronically active polymers and polymer brushes for tailoring surface morphology and functionality. An overview of future possibilities, with regard to challenges and opportunities in this field, is given at the end of the paper.

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“…Patterned polymer brushes, due to their effective function in surface modification, have received a great deal of attention , . The patterning approaches, in particular for polymer mixed brushes, include lithographic techniques ranging from the conventional photolithography to microcontact printing, electron beam patterning and dip‐pen nanodisplacement lithography , , …”

Section: Introductionmentioning

confidence: 99%