2015
DOI: 10.1016/j.jallcom.2014.12.203
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication of CdTe/NiTe films on Ni foils by radio-frequency magnetron sputtering method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2015
2015
2023
2023

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 12 publications
(1 citation statement)
references
References 54 publications
0
1
0
Order By: Relevance
“…Various techniques have been employed to deposit CdTe films, such as, closed space sublimation [4], electron beam evaporation [5], RF magneto sputtering [6], hot wall epitaxy [7], pulsed laser deposition [8], pulsed laser evaporation [9], molecular beam epitaxy [10], chemical vapor deposition [11], electrodeposition [12] and thermal evaporation [13]. Out of these methods, thermal evaporation stands out due to its low level of impurity presence in the growing layer, low trend of oxide formation, straight-line propagation of vapors from source to substrate, high deposition rate, low material consumption as well as low cost of operation.…”
Section: Introductionmentioning
confidence: 99%
“…Various techniques have been employed to deposit CdTe films, such as, closed space sublimation [4], electron beam evaporation [5], RF magneto sputtering [6], hot wall epitaxy [7], pulsed laser deposition [8], pulsed laser evaporation [9], molecular beam epitaxy [10], chemical vapor deposition [11], electrodeposition [12] and thermal evaporation [13]. Out of these methods, thermal evaporation stands out due to its low level of impurity presence in the growing layer, low trend of oxide formation, straight-line propagation of vapors from source to substrate, high deposition rate, low material consumption as well as low cost of operation.…”
Section: Introductionmentioning
confidence: 99%