Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

Wagner, Estelle; Sandu, Cosmin S.; Harada, Scott; Benvenuti, Giacomo; Savu, Veronica; Muralt, Paul

doi:10.1016/j.tsf.2015.04.021

Cited by 10 publications

(12 citation statements)

References 33 publications

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“…In the present Research Article, we will focus on graded deposits of single and multielement oxides and show that the deposited thickness and the chemical composition are in good agreement with calculations, assuming that all precursor molecules reaching the substrate decompose. This imposes to work in a mass transfer limited deposition regime, which is usually obtained at intermediate surface temperature for single element deposition. , …”

Section: Resultsmentioning

confidence: 99%

“…TiO 2 deposits (from Ti(OiPr) 4 , CAS = 546-68-9), Nb 2 O 5 (from Nb(OEt) 4 dmae, SAFC research product), HfO 2 (from Hf(O-tBu) 4, CAS = 2172.02.3), ZrO 2 (from Zr(OtBu) 4 , CAS = 2081-12-1), and Ta 2 O 5 (from Ta(OEt) 5 , CAS = 150747-55-0) were deposited varying the number of active segments. For these precursors, at sufficient substrate temperature to overcome the activation energy of the precursor decomposition reaction, , the deposition takes place in the mass transfer limited regime, and the deposited thickness is directly proportional to the precursor flow, with a conversion efficiency factor of precursor into deposit close to 1. (Also possibly named “reactive sticking coefficient”, the conversion efficiency factor is defined as the ratio between the number of metal atoms incorporated in the deposited film (calculated from thin film thickness measurements) and the number of metal atoms impinging on the substrate (calculated from precursor flow simulation).…”

Section: Resultsmentioning

confidence: 99%

“…This imposes to work in a mass transfer limited deposition regime, which is usually obtained at intermediate surface temperature for single element deposition. 82,34 Graded Thickness Single Element Oxide Films. For a single element deposition, the Sybilla 150 reactor allows the independent activation of each of the six effusive segments.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

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Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations

Wagner¹,

Sandu²,

Harada³

et al. 2016

ACS Comb. Sci.

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An innovative deposition system has been developed to construct complex material thin films from single-element precursors by chemical beam vapor deposition (CBVD). It relies on well distributed punctual sources that emit individually controlled precursor beams toward the substrate under high vacuum conditions combined with well designed cryo-panel surfaces that avoid secondary precursor sources. In this configuration the impinging flows of all precursors can be calculated at any substrate point considering the controlled angular distribution of the emitted beams and the ballistic trajectory of the molecules. The flow simulation is described in details. The major advantage of the deposition system is its ability to switch between several possible controlled combinatorial configurations, in which the substrate is exposed to a wide range of flow compositions from the different precursors, and a uniform configuration, in which the substrate is exposed to a homogeneous flow, even on large substrates, with high precursor use efficiency. Agreement between calculations and depositions carried out in various system configurations and for single, binary, or ternary oxides in mass transfer limited regime confirms that the distribution of incoming precursors on the substrate follows the theoretical models. Additionally, for some selected precursors and in some selected conditions, almost 100% of the precursor impinging on the substrate is incorporated to the deposit. The results of this work confirm the potentialities of CBVD both as a research tool to investigate efficiently deposition processes and as a fabrication tool to deposit on large surfaces.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: ■ Results and Discussionmentioning

confidence: 99%

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Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations

Wagner¹,

Sandu²,

Harada³

et al. 2016

ACS Comb. Sci.

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“…44,45 A more sophisticated segmented source was described by Wagner for use in what is termed a chemical beam vapor deposition (CBVD) system. 35,[41][42][43]46 Their system (Sybilla 150 from ABCD Technology) was specifically designed for oxide material deposition. It is shown schematically in Figure 1.…”

Section: ■ Introductionmentioning

confidence: 99%

“…Individual regions can be defined through the use of a mask. 41 One CVD approach employing a shutter is described below, and more extensive shuttering/masking approaches in PVD are described later.…”

Section: ■ Introductionmentioning

confidence: 99%

Thin-Film Processing Routes for Combinatorial Materials Investigations—A Review

McGinn

2019

ACS Comb. Sci.

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High-throughput combinatorial investigations are transforming materials discovery, phase diagram development, and processing optimization. Thin-film deposition techniques are frequently used to fabricate sample libraries employed in these studies. Various adaptations of well-known thin-film chemical vapor deposition (CVD) and physical vapor deposition (PVD) techniques utilized for the synthesis of inorganic combinatorial thin-film materials libraries are reviewed, with novel processing approaches being highlighted. Methods for developing gradients in composition of other film properties are described. Issues and considerations specific to thin-film processing of combinatorial materials libraries are discussed, with some emphasis on catalytic applications.

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Efficient Optimization of High‐Quality Epitaxial Lithium Niobate Thin Films by Chemical Beam Vapor Deposition: Impact of Cationic Stoichiometry

Pellegrino,

Wagner,

Lo Presti

et al. 2023

Adv Materials Inter

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Lithium niobate is a material of special interest for its challenging functional properties, which can suit various applications. However, high quality 200‐mm LixNb1‐xO3 thin film grown on sapphire substrate have never been reported so far which limits these potential applications. This paper reports the efficient optimization of high quality LiNbO3 thin film deposition on sapphire (001) substrate through chemical beam vapor deposition in a combinatorial configuration. With this technique, flow ratio of Li/Nb can be tuned from ≈0.25 to ≈2.45 on a single wafer. Various complementary characterizations (by means of diffraction, microscopy and spectroscopy techniques) have been performed at different areas of the film (different cationic ratios) in order to investigate the impact of the cationic stoichiometry deviation on the film properties. Close to cationic stoichiometry (LiNbO3), the epitaxial films are of high quality (single phase in spite of two in‐plane domains, low mosaicity of 0.04°, low surface roughness, refractive index and band gap close to bulk values). Deviating from the stoichiometry conditions, secondary phases are detected (LiNb3O8 for Nb‐rich flow ratios, and Li3NbO4 with partial amorphization for Li‐rich flow ratios). LiNbO3 films are of high interest for various key applications in data communications among others.

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Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

Cited by 10 publications

References 33 publications

Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations

Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations

Thin-Film Processing Routes for Combinatorial Materials Investigations—A Review

Efficient Optimization of High‐Quality Epitaxial Lithium Niobate Thin Films by Chemical Beam Vapor Deposition: Impact of Cationic Stoichiometry

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