Fabrication of crack-free strained SiGe/Ge multiple quantum wells on Ge-on-Si(111) by the patterning method

Kanesawa, R.; Kikuoka, S.; Shibahara, Y.; Wagatsuma, Y.; Yamada, M.; Hamaya, K.; Sawano, K.

doi:10.1016/j.mssp.2024.108300

Materials Science in Semiconductor Processing

2024

DOI: 10.1016/j.mssp.2024.108300

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Fabrication of crack-free strained SiGe/Ge multiple quantum wells on Ge-on-Si(111) by the patterning method

R. Kanesawa,

S. Kikuoka,

Y. Shibahara

et al.

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Fabrication of crack-free strained SiGe/Ge multiple quantum wells on Ge-on-Si(111) by the patterning method

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References 21 publications

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