“…To date, good experimental results have been achieved by optimizing the substrates and process conditions [ 9 , 12 , 14 , 15 , 16 , 17 , 18 , 19 , 20 ]. For example, through increasing the buffer layers between the junction and the substrate to reduce the dielectric loss, the energy relaxation time T1 of the all-nitride junctions reaches 16 microseconds (ms), and the phase relaxation time T2 reaches 22 ms [ 13 , 21 ]. However, the results still fall short of expectations.…”