2007
DOI: 10.1016/j.electacta.2006.08.048
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Fabrication of flat silicon surfaces using ion-exchange particles in ultrapure water

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“…It was almost the same level as the roughness (R a < 0:5 nm in a 2 Â 2 mm 2 ) of the etched surface of Si(001). 20) Therefore, we thought the surface flatness of the crystal obtained from aniline solvent was satisfactory. Furthermore, a 5 Â 5 mm 2 area of the rubrene crystal was observed [Fig.…”
Section: Evaluations Of Obtained Crystalsmentioning
confidence: 96%
“…It was almost the same level as the roughness (R a < 0:5 nm in a 2 Â 2 mm 2 ) of the etched surface of Si(001). 20) Therefore, we thought the surface flatness of the crystal obtained from aniline solvent was satisfactory. Furthermore, a 5 Â 5 mm 2 area of the rubrene crystal was observed [Fig.…”
Section: Evaluations Of Obtained Crystalsmentioning
confidence: 96%