Fabrication of Flyable Perpendicular Discrete Track Media

Moneck, Matthew T.; Zhu, Jian‐Gang; Che, Xiaodong; Tang, Yaw-Shing; Lee, Hyung Jai; Zhang, Shuyu; Moon, Kibong; Takahashi, Nobuyuki

doi:10.1109/tmag.2007.893706

Cited by 22 publications

(10 citation statements)

References 8 publications

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“…In such a case, the connecting base layer will be a background layer that can be eliminated by Ar + milling, which is the second step of the process. Ar + milling is known to be a soft milling process capable of reliably transferring patterns in metals, in particular, cobalt . The final resolution of this nanofabrication method can be limited by different physical effects occurring during ion milling .…”

Section: Resultsmentioning

confidence: 99%

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling

Córdoba

2014

ACS Nano

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One of the main features of any lithography technique is its resolution, generally maximized for a single isolated object. However, in most cases, functional devices call for highly dense arrays of nanostructures, the fabrication of which is generally challenging. Here, we show the growth of arrays of densely packed isolated nanowires based on the use of focused beam induced deposition plus Ar(+) milling. The growth strategy presented herein allows the creation of films showing thickness modulation with periodicity determined by the beam scan pitch. The subsequent Ar(+) milling translates such modulation into an array of isolated nanowires. This approach has been applied to grow arrays of W-based nanowires by focused ion beam induced deposition and Co nanowires by focused electron beam induced deposition, achieving linear densities up to 2.5 × 10(7) nanowires/cm (one nanowire every 40 nm). These results open the route for specific applications in nanomagnetism, nanosuperconductivity, and nanophotonics, where arrays of densely packed isolated nanowires grown by focused beam deposition are required.

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Section: Resultsmentioning

confidence: 99%

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling

Córdoba

2014

ACS Nano

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“…To use nanoimprint lithography 1,2 ͑NIL͒ for patterned magnetic media [3][4][5] fabrication, template and imprinted resist topography features such as critical dimension ͑CD͒, sidewall angle ͑SWA͒, and feature height ͑FH͒ are crucial information for the understanding and control of the processing steps. However, high pattern density, small feature size ͑ϳ10 nm͒, and unique resist material properties involved in this application pose significant metrology challenges for commonly used techniques such as scanning electron microscopy ͑SEM͒ and atomic force microscopy ͑AFM͒.…”

Section: Introductionmentioning

confidence: 99%

“…[6][7][8] A range of numerical methods, such as the rigorous coupled wave analysis ͑RCWA͒ algorithm, has been developed to calculate the fields scattered from these structures with high degrees of accuracy. 4,5 Variations in grating profiles cause observable changes in the SE spectra, which can be modeled to extract pattern topography information. Like conventional SE applications in thin films, the regression procedure and model validation can be rather challenging due to uncertainties in material properties and problems such as parameter correlation.…”

Section: Introductionmentioning

confidence: 99%

Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Hwu

Liu

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Articles you may be interested inNanofabrication of high aspect ratio (50:1) sub-10nm silicon nanowires using inductively coupled plasma etching J. Vac. Sci. Technol. B 30, 06FF02 (2012); 10.1116/1.4755835Study of silica nano-pattern erosion in H2SO4-H2O2 mixture using spectroscopic ellipsometry Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate Surface characterization of imprinted resist above glass transition temperatureThe authors have applied spectroscopic ellipsometry optical critical dimension ͑SE-OCD͒ measurement to grating templates and imprinted resist patterns with a pitch of 72.6 nm, corresponding to a track density of 350 ktpi ͑kilotracks per inch͒ for discreet track recording media. Their experiments indicate that SE-OCD is sensitive in detecting topography features in template profiles. The measurement of imprinted resist pattern is complicated by parameter correlation. Comparison of SE-OCD reported template and imprinted resist profiles can be used to study imprint pattern fidelity.

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“…A process for fabricating discrete track media from sputtered perpendicular magnetic disks has been developed. The process utilized electron beam lithography, ion milling, and an Al sacrificial layer to create 50, 100, 150, and tapered tracks, respectively (Moneck et al 2007).…”

Section: Introductionmentioning

confidence: 99%

Fabrication of optical disk mastering using electron beam and embossing process

Pan

Yang

et al. 2007

Opt Quant Electron

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For the requirement of higher storage capacity of an optical disk, it is a good choice to shorten pit length and linewidth. However, the conventional laser beam mastering is difficult to fabricate smaller pit length and linewidth because of the optical diffraction limit. In order to solve this problem, optical disk mastering using electron beam lithography is presented. The process parameters of the electron beam mastering such as beam current, constant linear stage velocity, developing time, and focus distance are discussed in this research. In the experiments, it was found that the focus distance is an important parameter to fabricate nano-linewidth. The experimental results reveal that the 10 µm variance in focus distance causes about 12% variation in linewidth. The photoresist with nano-pattern defined by eletron beam was transferred into metal Ni-Co (Nickel-Cobalt) mold by electroplating process. The Ni-Co mold with hardness larger than Vicker Hardness (Hv) 650 was developed. Then, with the Ni-Co mold, LIGA (German: Lithographie GaVanoformung Abformung) process was applied to replicate high-density optical disk. The Ni-Co mold is served as a master for hot embossing process to transfer the nano-pattern onto PMMA sheet. Since the feature size is in nano-meter range, the study presents an innovative demolding mechanism to demold the master from the PMMA sheet without damaging the nano-meter structure. A spiral nanogroove with 112 nm in linewidth and 80 nm in depth has been successfully fabricated about 50 Gbytes storage capacity.

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Fabrication of Flyable Perpendicular Discrete Track Media

Cited by 22 publications

References 8 publications

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling

Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Fabrication of optical disk mastering using electron beam and embossing process

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Fabrication of Flyable Perpendicular Discrete Track Media

Cited by 22 publications

References 8 publications

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar+ Milling

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar+ Milling

Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Fabrication of optical disk mastering using electron beam and embossing process

Contact Info

Product

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Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling

Arrays of Densely Packed Isolated Nanowires by Focused Beam Induced Deposition Plus Ar⁺ Milling