Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

Overbuschmann, J.; Hengster, Julia; Irsen, Stephan; Wilhein, Thomas

doi:10.1364/ol.37.005100

Cited by 14 publications

(9 citation statements)

References 9 publications

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“…Nevertheless recently, we could show that FZPs with good imaging properties can indeed be prepared with IBL and features as small as 120 nm could be resolved in the soft X-rays range at 1200 eV [31]. Other IBL prepared FZPs with resolutions of about 172 nm and their utilization as objective lens in a full field laboratory microscope in the extreme UV range at 13 nm wavelength (95 eV) were also reported a few months later [32].…”

Section: Ion Beam Lithography As Manufacturing Technique For Fresnel ...mentioning

confidence: 76%

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Keskinbora¹,

Grévent²,

Bechtel³

et al. 2013

Opt. Express

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Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2 nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1 st , 2 nd and 3 rd order focus respectively. Measured efficiencies in the 1 st and 2 nd order of diffraction reach the theoretical predictions. References and links1. D. T. Attwood, Soft X-rays and extreme ultraviolet radiation (Cambridge University Press, 1999). 2. A. Sakdinawat and D. Attwood, "Nanoscale X-ray imaging," Nature Photonics 4, 840-848 (2010). 3. R. Falcone, C. Jacobsen, J. Kirz, S. Marchesini, D. Shapiro, and J. Spence, "New directions in X-ray microscopy," Contemp. Phys. 52, 293-318 (2011). 4. B. Kaulich, P. Thibault, A. Gianoncelli, and M. Kiskinova, "Transmission and emission x-ray microscopy: operation modes, contrast mechanisms and applications," J. (12) in this article (equation (13) and (14)

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Section: Ion Beam Lithography As Manufacturing Technique For Fresnel ...mentioning

confidence: 76%

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Keskinbora¹,

Grévent²,

Bechtel³

et al. 2013

Opt. Express

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“…Removal of large volumes of material (for instance, 100 µm diameter, 500 nm gold thickness [ 36 ]) usually means lengthy processes that require an multi-pass-exposure (MP-E) strategy as depicted in Fig. 1 , and involves drift correction steps in between cycles [ 29 , 35 – 36 ]. In some cases, the drift correction can be unnecessary, but the MP-E can still be desired when a better dose distribution or a well-defined wall geometry is aimed for in structures with higher aspect ratio [ 38 ].…”

Section: Resultsmentioning

confidence: 99%

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

Keskinbora

Sanli

Baluktsian

et al. 2018

Beilstein J. Nanotechnol.

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Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct writing/milling capability. IBL allows for rapid prototyping of high-resolution FZPs that can be used for high-resolution imaging at soft X-ray energies. Here, we discuss improvements in the process enabling us to write zones down to 15 nm in width, achieving an effective outermost zone width of 30 nm. With a 35% reduction in process time and an increase in resolution by 26% compared to our previous results, we were able to resolve 21 nm features of a test sample using the FZP. The new process conditions are then applied for fabrication of large arrays of high-resolution zone plates. Results show that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics.

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“…In particular, the approach decouples the formation of image contrast from the spatial resolution. Focused reference beam X-ray holography is straightforward to implement and permits the application of easy-to-fabricate FZPs, that is, by FIB milling35. We provide a robust algorithm to remove image artefacts arising from the diffractive nature of the FZP lens, yielding high-quality images.…”

Section: Discussionmentioning

confidence: 99%

Monolithic focused reference beam X-ray holography

et al. 2014

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Fourier transform holography is a highly efficient and robust imaging method, suitable for single-shot imaging at coherent X-ray sources. In its common implementation, the image contrast is limited by the reference signal generated by a small pinhole aperture. Increased pinhole diameters improve the signal, whereas the resolution is diminished. Here we report a new concept to decouple the spatial resolution from the image contrast by employing a Fresnel zone plate to provide the reference beam. Superimposed on-axis images of distinct foci are separated with a novel algorithm. Our method is insensitive to mechanical drift or vibrations and allows for long integration times common at low-flux facilities like high harmonic generation sources. The application of monolithic focused reference beams improves the efficiency of high-resolution X-ray Fourier transform holography beyond all present approaches and paves the path towards sub-10 nm single-shot X-ray imaging.

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Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

Cited by 14 publications

References 9 publications

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Ion beam lithography for Fresnel zone plates in X-ray microscopy

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

Monolithic focused reference beam X-ray holography

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