Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography

Yunfeng, 白云峰 Bai; Jie, 范杰 Fan; Yonggang, 邹永刚 Zou; Haizhu, 王海珠 Wang; Yina, 海一娜 Hai; Kun, 田锟 Tian

doi:10.3788/lop54.120501

Cited by 2 publications

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“…Bai Yunfeng et al coated a layer of SiO 2 film on GaAs and applied a layer of photoresist on the SiO 2 surface using a homogeniser; then used laser interference lithography to engrave a pattern on the photoresist and used the photoresist as a mask to etch SiO 2 to form a surface hard mask; finally used reactive coupled plasma (ICP) etching to transfer the pattern on the SiO 2 film to GaAs, and then after cleaning, removing SiO 2 and other steps to prepare a 976 nm distributed feedback laser grating with a period of 300 nm, a duty cycle of about 0.4, a slot depth of 100 nm, a flat upper bottom surface and a uniform stripe distribution [11]. (as shown in Figure 3).…”

Section: Laser Interference Lithographymentioning

confidence: 99%

Research progress of laser lithography

Tian

2023

J. Phys.: Conf. Ser.

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Lithography is one of the key technologies that restrict the development of the semiconductor industry and its important role continues to be highlighted. This paper will review laser projection lithography and laser maskless lithography based on the theoretical knowledge of laser lithography, present the advantages of laser maskless lithography, discuss the latest progress of laser lithography in application fields, explore its development prospects and trends, and provide some ideas and inspiration for the further development of human laser lithography. The result shows that laser lithography can be used in the field of material processing, and lithography is one of the key technologies to fabricate semiconductor devices. The world’s most advanced lithography machine is the EUV lithography machine of the Dutch ASML. This EUV lithography machine can be used for the production of 5nm chips, so 5nm is the most advanced chip manufacturing process that EUV lithography machine can achieve. Since lithography is a high degree of composite technology, each component plays an irreplaceable role. Therefore, if further improvements are to be made to the chip process, researchers should look at all parts of the exposure system, photoresist and process technology to make them work together in harmony.

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Section: Laser Interference Lithographymentioning

confidence: 99%