13th International Symposium on the Physical and Failure Analysis of Integrated Circuits 2006
DOI: 10.1109/ipfa.2006.251050
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Fabrication of high Ge content SiGe layer on Si by Ge condensation technique

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Cited by 6 publications
(5 citation statements)
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“…The change in the sensitivity of the plasma-treated nanowire is opposite that of the bare nanowire in the temperature region 800∼950 ∘ C. At 1000 ∘ C, the sensitivity of the bare nanowire sample decreases. According to the literature, temperature has an important effect on the SGOI structure [41][42][43]. It is observed that the raise of the sensitivity of "bare" SiGe nanowire is more obvious at temperature of 950 ∘ C due to better concentration and enough energy to recrystallize.…”
Section: Resultsmentioning
confidence: 99%
“…The change in the sensitivity of the plasma-treated nanowire is opposite that of the bare nanowire in the temperature region 800∼950 ∘ C. At 1000 ∘ C, the sensitivity of the bare nanowire sample decreases. According to the literature, temperature has an important effect on the SGOI structure [41][42][43]. It is observed that the raise of the sensitivity of "bare" SiGe nanowire is more obvious at temperature of 950 ∘ C due to better concentration and enough energy to recrystallize.…”
Section: Resultsmentioning
confidence: 99%
“…According to the literature, temperature has important effects on SGOI structure [22,24]. A suitable thermal budge can re-crystallize the interface between the oxide and SiGe, reducing the number of dislocations and interior defects.…”
Section: Resultsmentioning
confidence: 99%
“…Like dislocations and interstitials, surface defects that are formed by oxidation and strain can cause lattice mismatches between oxide and SiGe layer that can affect carrier mobility in the sensor device. Accordingly, an improved understanding of the characteristics that are produced by Ge condensation [24,25] is needed to optimize and improve biosensor sensitivity. In this work, ambient oxidation, oxidation time and nano-wire structure were varied while the oxidation temperature was fixed at 950°C to prevent the undesirable consequences of an inappropriately low or high temperature during Ge condensation.…”
Section: Introductionmentioning
confidence: 99%
“…From the above discussion, the conductance and sensitivity can be improved by forming a stacked structure, which makes carriers pass through the surface with higher conductivity and increasing the surface-to-volume ratio, further causing the condensation of the carriers. According to the research [22,23,24], Ge condensation can increase the fraction of Ge at the surface, causing the rejection of Ge from the SiO 2 upon oxidation. Figure 9 presents the results of using three ambient treatments-in pure N 2 , pure O 2 and O 2 mixed with 13.33% N 2 .…”
Section: Resultsmentioning
confidence: 99%