Fabrication of Highly Doped MLG Patterns Using Selective CVD and MoCl<sub>5</sub> Intercalation

Ketsombun, Ekkaphop; Akimoto, Tomoki; Ueno, Kazuyoshi

doi:10.1109/iitc51362.2021.9537349

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2022

2023

Publication Types

Select...

Article1

Other1

Relationship

Self Cite0

Independent2

Authors

Journals

Cited by 2 publications

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…9. (Color online) Selective CVD of highly crystalline MLG on patterned Ni catalyst: (a) schematic structure, (b) Raman spectra for the patterned MLG indicating high crystallinity and (c) Raman G-band shifts indicating efficient doping by MoCl 5 intercalation 50,51).…”

mentioning

confidence: 99%

Advances in multilayer graphene processes for metallization and high-frequency devices

Ueno

2022

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

Multilayer graphene (MLG) has been expected as an alternative material for nanometer wide interconnects. However, it has not been put into practical use, since the process technology that leads to practical use has been immature. Recent advances in the MLG processes and applications such as MLG capped copper interconnects, direct deposition of MLG by solid-phase deposition at a low-temperature, stable intercalation doping to MLG, and selective CVD of high crystallinity MLG for inductor and antenna applications are reviewed. According to these advances, MLG is considered to be approaching to the practical applications for device metallization and high frequency devices. Based on the characteristics of MLG as a conductor and recent development trends, the prospects and issues for future practical use of MLG graphene are discussed.

show abstract

mentioning

confidence: 99%

Advances in multilayer graphene processes for metallization and high-frequency devices

Ueno

2022

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

show abstract

Intercalated Multilayer Graphene / Nickel Hybrid Antenna With Enhanced Inductance Density for Size Reduction

Hosokawa

Matsunaga

Ueno

2023

2023 7th IEEE Electron Devices Technology &Amp; Manufacturing Conference (EDTM)

View full text Add to dashboard Cite

Fabrication of Highly Doped MLG Patterns Using Selective CVD and MoCl₅ Intercalation

Cited by 2 publications

References 4 publications

Advances in multilayer graphene processes for metallization and high-frequency devices

Advances in multilayer graphene processes for metallization and high-frequency devices

Intercalated Multilayer Graphene / Nickel Hybrid Antenna With Enhanced Inductance Density for Size Reduction

Contact Info

Product

Resources

About

Fabrication of Highly Doped MLG Patterns Using Selective CVD and MoCl5 Intercalation

Cited by 2 publications

References 4 publications

Advances in multilayer graphene processes for metallization and high-frequency devices

Advances in multilayer graphene processes for metallization and high-frequency devices

Intercalated Multilayer Graphene / Nickel Hybrid Antenna With Enhanced Inductance Density for Size Reduction

Contact Info

Product

Resources

About

Fabrication of Highly Doped MLG Patterns Using Selective CVD and MoCl₅ Intercalation