2013
DOI: 10.1021/la4033282
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Fabrication of Highly Transparent and Conductive Indium–Tin Oxide Thin Films with a High Figure of Merit via Solution Processing

Abstract: Deposition technology of transparent conducting oxide (TCO) thin films is critical for high performance of optoelectronic devices. Solution-based fabrication methods can result in substantial cost reduction and enable broad applicability of the TCO thin films. Here we report a simple and highly effective solution process to fabricate indium-tin oxide (ITO) thin films with high uniformity, reproducibility, and scalability. The ITO films are highly transparent (90.2%) and conductive (ρ = 7.2 × 10(-4) Ω·cm) with … Show more

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Cited by 301 publications
(186 citation statements)
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“…All samples were sputter-cleaned using an Ar 1+ ion gun operated at 500V for 10 minutes with a sputter current of 2-3 µA. Figure S1(a) shows the XPS spectra of the Cu-precursor (Cu(acac) 2 ) itself, which matches previously published data on (Cu(acac) 2 ) [1]. The Copper region of as grown samples shows Cu in a +1 oxidation state with a mixture of the unreacted Cu precursor present (Fig S1(b)).…”
supporting
confidence: 76%
See 1 more Smart Citation
“…All samples were sputter-cleaned using an Ar 1+ ion gun operated at 500V for 10 minutes with a sputter current of 2-3 µA. Figure S1(a) shows the XPS spectra of the Cu-precursor (Cu(acac) 2 ) itself, which matches previously published data on (Cu(acac) 2 ) [1]. The Copper region of as grown samples shows Cu in a +1 oxidation state with a mixture of the unreacted Cu precursor present (Fig S1(b)).…”
supporting
confidence: 76%
“…Currently commercially available n-type TCMs, such as indium tin oxide (ITO), possess conductivities as high as 1000 S/cm with transparencies greater than 80%. 1 Potential applications that require p-type materials with similar properties include transparent p-n junctions, which would allow for fully-transparent displays. 2 Alternatively, they can be used to minimize shunting as hole injection/extraction layers in light-emitting diodes/solar cells.…”
mentioning
confidence: 99%
“…[1][2][3][4][5] Indium tin oxide (ITO) has unambiguously been the most widely used TCE material because of its optical transparency, thermal/chemical stability and device compatibility, coupled with its well-established fabrication processes. 6,7 However, the brittle nature of ITO might limit its role in future devices. 8 For instance, 150 nm-thick amorphous-ITO (a-ITO) films or 100 nm-thick crystalline-ITO (c-ITO) mounted on a plastic film (thickness: 100 μm) would crack with a bending radius of o3 mm.…”
Section: Introductionmentioning
confidence: 99%
“…1 The industry standard material is indium tin oxide (ITO) due to its high conductivity (≈ 1000 Scm −1 ) and transparency (>80%). 2 The development of indium gallium zinc oxide (IGZO), a ternary oxide retaining mobility in its amorphous state, has allowed for commercial products utilizing IGZO as a transparent thin film transistor (TTFT) in the backplane of flat panel displays. 3 IGZO has been essential for high dpi, low power, and 4 K high resolution displays.…”
Section: Introductionmentioning
confidence: 99%