In this letter we demonstrate a low temperature (≈ 345 • C) growth method for Cu deficient CuCrO 2 performed by spray pyrolysis using metal-organic precursors and a simple air blast nozzle. Smooth films were grown on glass substrates with a highest conductivity of 12 S/cm. The most conductive samples retain transparencies above 55% resulting in a figure of merit as high as 350 µS, which is the best performing p-type transparent conducting material grown by solution methods to date. Remarkably despite the nano-crystallinity of the films, properties comparable with crystalline CuCrO 2 are observed. No postannealing of the films is required in contrast to previous reports on crystalline material. The low processing temperature of this method means the material can be deposited on flexible substrates. As this is a solution based technique it is more attractive to industry as physical vapour deposition methods are slow and costly in comparison.p-type transparent conducting materials (TCMs) are sought after for optoelectronic devices. Currently commercially available n-type TCMs, such as indium tin oxide (ITO), possess conductivities as high as 1000 S/cm with transparencies greater than 80%. 1 Potential applications that require p-type materials with similar properties include transparent p-n junctions, which would allow for fully-transparent displays. 2 Alternatively, they can be used to minimize shunting as hole injection/extraction layers in light-emitting diodes/solar cells. 3,4 The main interest in this field originated from the potential of the delafossites with the A 1+ B 3+ O 2 lattice structure first highlighted in 1997 when CuAlO 2 was reported to exhibit ptype conductivity while maintaining high transparency. 5 Since then the field has extended to other materials such as oxychalcogenides, spinels and α-Cr 2 O 3 . 6-9 One of the delafossites, CuCrO 2 , has shown promise as a p-type TCM due to reports of high conductivity when doped with Mg. 10 However this is typically only achieved by physical vapour deposition (PVD) which is a relatively slow and costly technique in comparison to other depostion methods. CuCrO 2 has also been grown by chemical vapour deposition (CVD) using the metal-organic Acetylacetonate (acac) precursors Cr(acac) 3 and Cu(acac) 2 at 550 • C, resulting in polycrystalline films with conductivity of 0.86 S/cm (figure of merit (FOM) ≈ 45 µS). 11 Spray pyrolysis (SP) is an inexpensive technique that is suited to depositing films over a large area. Mg-doped films of CuCrO 2 have been synthesized by SP using the same acac precursors with the Mg(acac) 2 precursor for doping. Only after postannealing at 700 • C did they achieve conductivities of 0.6-1 S/cm. 12,13 CuCrO 2 :Zn grown by solgel processing show conductivities of around 0.47 S/cm after two postannealing steps. 14 The high temperature required by these methods is a major drawback for using a) Electronic mail: lefarrel@tcd.ie the material in practical devices. In this letter SP was used to grow thin (50-100 nm) Cu deficient CuCrO 2 film...