Abstract:The plasma maskless processing method combines the advantages of plasma etching and scanning probe processing, such as high etching efficiency, wide range of applicable materials, and high resolution. This method is based on the probe driving and detection of piezoelectric thin films, which enables all probes in the array to be processed completely independently, greatly improving the overall processing efficiency, and can effectively etch specific nano-scale regions of various materials. And it provides an ef… Show more
“…Tis article has been retracted by Hindawi, as publisher, following an investigation undertaken by the publisher [1]. Tis investigation has uncovered evidence of systematic manipulation of the publication and peer-review process.…”
“…Tis article has been retracted by Hindawi, as publisher, following an investigation undertaken by the publisher [1]. Tis investigation has uncovered evidence of systematic manipulation of the publication and peer-review process.…”
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