2010
DOI: 10.1016/j.tsf.2010.08.155
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Fabrication of horizontally grown silicon nanowires using a thin aluminum film as a catalyst

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Cited by 3 publications
(2 citation statements)
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“…Once the vertical silicon NWs are introduced in the semiconductor industry, a whole new architecture will be required to fabricate an electronic device. Incorporating these NWs in the current architecture will be more convenient and feasible if the silicon NWs are grown horizontally [35,[74][75][76][77].…”
Section: Structure Design and Simulationsmentioning
confidence: 99%
“…Once the vertical silicon NWs are introduced in the semiconductor industry, a whole new architecture will be required to fabricate an electronic device. Incorporating these NWs in the current architecture will be more convenient and feasible if the silicon NWs are grown horizontally [35,[74][75][76][77].…”
Section: Structure Design and Simulationsmentioning
confidence: 99%
“…Recently horizontal silicon nanowires (SiNWs) has been reported using a thin aluminum layer as a catalyst [1,2]. The nanowires were grown at the grain boundaries of the aluminum layer that was deposited on a silicon wafer.…”
Section: Introductionmentioning
confidence: 99%