“…[19][20][21][22] For practical applications, SERS substrates with high SERS activity and good signal uniformity are highly demanded. In order to achieve high SERS sensitivity and good signal uniformity, large-area well-ordered plasmonic nanostructure arrays have been manufactured by various methods, such as template-assisted methods, [23][24][25] photolithography, 26 electron beam lithography, [27][28][29] nanoimprint lithography 30 and femtosecond laser printing. 31,32 However, the abovementioned methods require expensive equipment or complicated manufacturing processes, leading to a high threshold for fabricating large-area well-ordered plasmonic nanostructures.…”